フォロー
Henryk Przewłocki
Henryk Przewłocki
Professor Emeritus Institute Electron Technology
確認したメール アドレス: ite.waw.pl - ホームページ
タイトル
引用先
引用先
The methods to determine flat-band voltage VFBin semiconductor of a MOS structure
K Piskorski, HM Przewlocki
The 33rd International Convention MIPRO, 37-42, 2010
572010
Theory and applications of internal photoemission in the MOS system at low electric fields
HM Przewlocki
Solid-State Electronics 45 (8), 1241-1250, 2001
402001
The triangular voltage sweep method as a tool in studies of mobile charge in MOS structures
HM Przewłocki, W Marciniak
physica status solidi (a) 29 (1), 265-274, 1975
281975
The inflection point of the capacitance-voltage, C (VG), characteristic and the flat-band voltage of metal-oxide-semiconductor structures
HM Przewlocki, T Gutt, K Piskorski
Journal of Applied Physics 115 (20), 2014
262014
Photoelectrical measurements of the local value of the contact potential difference in the metal–insulator semiconductor (MIS) structures
A Kudla, HM Przewlocki, L Borowicz, D Brzezinska, W Rzodkiewicz
Thin Solid Films 450 (1), 203-206, 2004
262004
New ways to measure the work function difference in MOS structures
SK Krawczyk, HM Przewłocki, A Jakubowski
Revue de Physique Appliquée 17 (8), 473-480, 1982
231982
Distributions of barrier heights, difference of effective contact potential, and local values of flat-band voltage in Al–SiO2–Si and poly–Si–SiO2–Si structures
HM Przewlocki, A Kudla, K Piskorski, D Brzezinska
Thin Solid Films 516 (12), 4184-4189, 2008
222008
Distribution of the contact-potential difference local values over the gate area of MOS structures
HM Przewlocki, A Kudla, D Brzezinska, HZ Massoud
Microelectronic Engineering 72 (1-4), 165-173, 2004
222004
Internal photoemission characteristics of metal–insulator–semiconductor structures at low electric fields in the insulator
HM Przewlocki
Journal of applied physics 85 (9), 6610-6618, 1999
221999
Effects of stress annealing in nitrogen on the effective contact-potential difference, charges, and traps at the interface of metal–oxide–semiconductor devices
HM Przewlocki, HZ Massoud
Journal of applied physics 92 (4), 2198-2201, 2002
212002
Photoelectric phenomena in metal‐insulator‐semiconductor structures at low electric fields in the insulator
HM Przewlocki
Journal of applied physics 78 (4), 2550-2557, 1995
201995
Effects of stress annealing in nitrogen on the index of refraction of silicon dioxide layers in metal–oxide–semiconductor devices
HZ Massoud, HM Przewlocki
Journal of applied physics 92 (4), 2202-2206, 2002
192002
Distribution of potential barrier height local values at Al-SiO2 and Si-SiO2 interfaces of the metal-oxide-semiconductor structures
K Piskorski, HM Przewlocki
Bulletin of the Polish Academy of Sciences Technical Sciences, 461-468-461-468, 2006
172006
Diagnostic measurements in LSI/VLSI integrated circuits production
A Jakubowski
World scientific, 1991
161991
A simple technique of work function difference determination in MOS structures
HM Przewlocki, S Krawczyk, A Jakubowski
physica status solidi (a) 65 (1), 253-257, 1981
161981
The importance, the nature and the measurement methods of the φMS factor in MOS structures
HM Przewłocki
Electron Technol 27 (1), 7-42, 1994
151994
Investigation of barrier height distributions over the gate area of Al-SiO2-Si structures
K Piskorski, HM Przewłocki
Journal of Telecommunications and information technology, 49-54, 2007
122007
Comparison of methods for φMS factor determination in metal-oxide-semiconductor (MOS) structures
HM Przewlocki
Electron Technol 26 (4), 3-23, 1993
121993
Universal system for photoelectric characterisation of semiconductor structures
S Porebski, P Machalica, J Zajac, L Borowicz, A Kudła, HM Przewłocki
IEE Proceedings-Science, Measurement and Technology 150 (4), 148-152, 2003
112003
Analysis of chemical shifts in Auger electron spectra versus sputtering time from passivated surfaces
A Domanowska, B Adamowicz, P Bidziński, A Klimasek, J Szewczenko, ...
Optica Applicata 41 (2), 441--447, 2011
102011
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