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Yi Zhang
Yi Zhang
University of East Anglia and SUSTech
Verified email at mail.sustech.edu.cn
Title
Cited by
Cited by
Year
High efficient polishing of sliced 4H-SiC (0001) by molten KOH etching
Y Zhang, H Chen, D Liu, H Deng
Applied Surface Science 525, 146532, 2020
352020
V2O5-C-SnO2 Hybrid Nanobelts as High Performance Anodes for Lithium-ion Batteries
L Zhang, M Yang, S Zhang, Z Wu, A Amini, Y Zhang, D Wang, S Bao, Z Lu, ...
Scientific Reports 6 (1), 33597, 2016
352016
An efficient approach for atomic-scale polishing of single-crystal silicon via plasma-based atom-selective etching
Z Fang, Y Zhang, R Li, Y Liang, H Deng
International Journal of Machine Tools and Manufacture 159, 103649, 2020
302020
A generic approach of polishing metals via isotropic electrochemical etching
R Yi, Y Zhang, X Zhang, F Fang, H Deng
International Journal of Machine Tools and Manufacture 150, 103517, 2020
282020
Indiscriminate revelation of dislocations in single crystal SiC by inductively coupled plasma etching
Y Zhang, R Li, Y Zhang, D Liu, H Deng
Journal of the European Ceramic Society 39 (9), 2831-2838, 2019
262019
Phosphorous doped graphitic-C3N4 hierarchical architecture for hydrogen production from water under visible light
L Zhang, Y Zhang, R Shi, S Bao, J Wang, A Amini, BN Chandrashekar, ...
Materials Today Energy 5, 91-98, 2017
262017
Rapid subsurface damage detection of SiC using inductivity coupled plasma
Y Zhang, L Zhang, K Chen, D Liu, D Lu, H Deng
International Journal of Extreme Manufacturing 3 (3), 035202, 2021
242021
Plasma-based isotropic etching polishing of synthetic quartz
R Li, Y Zhang, Y Zhang, W Liu, Y Li, H Deng
Journal of Manufacturing Processes 60, 447-456, 2020
112020
Tuning the plasma etching mode for the atomic-scale smoothing of single-crystal silicon
B Wu, Y Zhang, R Yi, H Deng
The Journal of Physical Chemistry Letters 13 (36), 8580-8585, 2022
92022
Highly efficient and atomic scale polishing of GaN via plasma-based atom-selective etching
L Zhang, B Wu, Y Zhang, H Deng
Applied Surface Science 620, 156786, 2023
72023
Role of oxygen in surface kinetics of SiO2 growth on single crystal SiC at elevated temperatures
Y Zhang, S Liang, Y Zhang, R Li, Z Fang, S Wang, H Deng
Ceramics International 47 (2), 1855-1864, 2021
62021
A general and ultrafast polishing method with truly atomic roughness
Y Zhang, Y Zhang, K Gu, L Zhang, Y Zhu, D Liu, H Deng
The Journal of Physical Chemistry Letters 14 (42), 9441-9447, 2023
2023
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