| Application of EUV resolution enhancement techniques (RET) to optimize and extend single exposure bi-directional patterning for 7nm and beyond logic designs RH Kim, O Wood, M Crouse, Y Chen, V Plachecki, S Hsu, K Gronlund Extreme Ultraviolet (EUV) Lithography VII 9776, 503-512, 2016 | 23 | 2016 |
| Comparison of left and right side line edge roughness in lithography L Sun, N Saulnier, G Beique, E Verduijn, W Wang, Y Xu, H Tang, Y Chen, ... Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016 | 21 | 2016 |
| Thin absorber extreme ultraviolet photomask based on Ni–TaN nanocomposite material D Hay, P Bagge, I Khaw, L Sun, O Wood, Y Chen, R Kim, ZJ Qi, Z Shi Optics Letters 41 (16), 3791-3794, 2016 | 19 | 2016 |
| Line edge roughness frequency analysis for SAQP process L Sun, X Zhang, S Levi, A Ge, H Zhou, W Wang, N Krishnan, Y Chen, ... Optical Microlithography XXIX 9780, 247-252, 2016 | 17 | 2016 |
| SAV using selective SAQP/SADP W Wang, RRH Kim, L Sun, E Verduijn, Y Chen US Patent 9,478,462, 2016 | 16 | 2016 |
| Object motion with structured optical illumination as a basis for far-subwavelength resolution KJ Webb, Y Chen, TA Smith Physical Review Applied 6 (2), 024020, 2016 | 14 | 2016 |
| Zero-mean circular Bessel statistics and Anderson localization JA Newman, Y Chen, KJ Webb Physical Review E 90 (2), 022119, 2014 | 13 | 2014 |
| Design intent optimization at the beyond 7nm node: the intersection of DTCO and EUVL stochastic mitigation techniques M Crouse, L Liebmann, V Plachecki, M Salama, Y Chen, N Saulnier, ... Design-Process-Technology Co-optimization for Manufacturability XI 10148 …, 2017 | 12 | 2017 |
| Printability and actinic AIMS review of programmed mask blank defects E Verduijn, P Mangat, O Wood, J Rankin, Y Chen, F Goodwin, R Capelli, ... Extreme Ultraviolet (EUV) Lithography VIII 10143, 112-124, 2017 | 12 | 2017 |
| Enhanced and tunable resolution from an imperfect negative refractive index lens Y Chen, YC Hsueh, M Man, KJ Webb JOSA B 33 (3), 445-451, 2016 | 12 | 2016 |
| Separating the optical contributions to line-edge roughness in EUV lithography using stochastic simulations A Chunder, A Latypov, Y Chen, JJ Biafore, HJ Levinson, T Bailey Advances in Patterning Materials and Processes XXXIV 10146, 72-80, 2017 | 11 | 2017 |
| Circular Bessel statistics: derivation and application to wave propagation in random media Y Chen, JA Newman, KJ Webb JOSA A 31 (12), 2744-2752, 2014 | 11 | 2014 |
| Method for producing self-aligned vias RRH Kim, W Wang, L Sun, E Verduijn, Y Chen US Patent 9,484,258, 2016 | 9 | 2016 |
| Thin absorber EUV photomask based on mixed Ni and TaN material D Hay, P Bagge, I Khaw, L Sun, O Wood, Y Chen, R Kim, ZJ Qi, Z Shi Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation …, 2016 | 9 | 2016 |
| Tip-to-tip variation mitigation in extreme ultraviolet lithography for 7 nm and beyond metallization layers and design rule analysis Y Chen, L Sun, ZJ Qi, S Zhao, F Goodwin, I Matthew, V Plachecki Journal of Vacuum Science & Technology B 35 (6), 2017 | 7 | 2017 |
| Sidewall spacer pattern formation method L Sun, X Zhang, R Xie, Y Chen US Patent 9,911,604, 2018 | 6 | 2018 |
| Measurement of through-focus EUV pattern shifts using the SHARP actinic microscope O Wood II, Y Chen, P Mangat, K Goldberg, M Benk, B Kasprowicz, ... International Conference on Extreme Ultraviolet Lithography 2017 10450, 38-43, 2017 | 5 | 2017 |
| Investigation of machine learning for dual OPC and assist feature printing optimization M Guajardo, Y Chen, P Brooker, CE Wu, K Hooker, F Latinwo, K Lucas Design-Process-Technology Co-optimization for Manufacturability XIII 10962 …, 2019 | 4 | 2019 |
| Directed self-assembly aware restricted design rule and its impact on design ability Y Chen, R Kim Design-Process-Technology Co-optimization for Manufacturability X 9781, 24-31, 2016 | 4 | 2016 |
| Holistic analysis of aberration induced overlay error in EUV lithography Y Chen, L Liebmann, L Sun, A Gabor, S Zhao, F Luo, O Wood II, X Chen, ... Extreme Ultraviolet (EUV) Lithography IX 10583, 94-104, 2018 | 3 | 2018 |
Lei SunGlobalfoundries, University of Rochester, Nankai University確認したメール アドレス: globalfoundries.com
