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Takayoshi OSHIMA
Takayoshi OSHIMA
Other names大島 孝仁
Verified email at nims.go.jp - Homepage
Title
Cited by
Cited by
Year
Ga2O3 thin film growth on c-plane sapphire substrates by molecular beam epitaxy for deep-ultraviolet photodetectors
T Oshima, T Okuno, S Fujita
Japanese Journal of Applied Physics 46 (11R), 7217, 2007
5912007
Carrier concentration dependence of band gap shift in n-type ZnO: Al films
JG Lu, S Fujita, T Kawaharamura, H Nishinaka, Y Kamada, T Ohshima, ...
Journal of Applied Physics 101 (8), 2007
5162007
Vertical solar-blind deep-ultraviolet Schottky photodetectors based on β-Ga2O3 substrates
T Oshima, T Okuno, N Arai, N Suzuki, S Ohira, S Fujita
Applied physics express 1 (1), 011202, 2008
4692008
ZnO-based thin films synthesized by atmospheric pressure mist chemical vapor deposition
JG Lu, T Kawaharamura, H Nishinaka, Y Kamada, T Ohshima, S Fujita
Journal of Crystal Growth 299 (1), 1-10, 2007
2112007
Flame detection by a β-Ga2O3-based sensor
T Oshima, T Okuno, N Arai, N Suzuki, H Hino, S Fujita
Japanese Journal of Applied Physics 48 (1R), 011605, 2009
1962009
β-Al2xGa2-2xO3 thin film growth by molecular beam epitaxy
T Oshima, T Okuno, N Arai, Y Kobayashi, S Fujita
Japanese Journal of Applied Physics 48 (7R), 070202, 2009
1662009
Surface morphology of homoepitaxial β-Ga2O3 thin films grown by molecular beam epitaxy
T Oshima, N Arai, N Suzuki, S Ohira, S Fujita
Thin Solid Films 516 (17), 5768-5771, 2008
1562008
Carrier confinement observed at modulation-doped β-(AlxGa1− x) 2O3/Ga2O3 heterojunction interface
T Oshima, Y Kato, N Kawano, A Kuramata, S Yamakoshi, S Fujita, T Oishi, ...
Applied Physics Express 10 (3), 035701, 2017
1392017
Carrier concentration induced band-gap shift in Al-doped Zn1− xMgxO thin films
JG Lu, S Fujita, T Kawaharamura, H Nishinaka, Y Kamada, T Ohshima
Applied physics letters 89 (26), 2006
1242006
Epitaxial growth of γ-Ga2O3 films by mist chemical vapor deposition
T Oshima, T Nakazono, A Mukai, A Ohtomo
Journal of crystal growth 359, 60-63, 2012
1192012
Properties of Ga2O3‐based (InxGa1–x) 2O3 alloy thin films grown by molecular beam epitaxy
T Oshima, S Fujita
physica status solidi c 5 (9), 3113-3115, 2008
1022008
Relationship between crystal defects and leakage current in β-Ga2O3 Schottky barrier diodes
M Kasu, K Hanada, T Moribayashi, A Hashiguchi, T Oshima, T Oishi, ...
Japanese Journal of Applied Physics 55 (12), 1202BB, 2016
942016
Electrical properties of Schottky barrier diodes fabricated on (001) β-Ga2O3 substrates with crystal defects
T Oshima, A Hashiguchi, T Moribayashi, K Koshi, K Sasaki, A Kuramata, ...
Japanese Journal of Applied Physics 56 (8), 086501, 2017
922017
Crystal defects observed by the etch-pit method and their effects on Schottky-barrier-diode characteristics on β-Ga2O3
M Kasu, T Oshima, K Hanada, T Moribayashi, A Hashiguchi, T Oishi, ...
Japanese Journal of Applied Physics 56 (9), 091101, 2017
832017
Wet etching of β-Ga2O3 substrates
T Oshima, T Okuno, N Arai, Y Kobayashi, S Fujita
Japanese journal of applied physics 48 (4R), 040208, 2009
732009
Band-gap narrowing in α-(CrxFe1-x)2O3 solid-solution films
H Mashiko, T Oshima, A Ohtomo
Applied Physics Letters 99 (24), 241904, 2011
662011
β-Ga2O3 single crystal as a photoelectrode for water splitting
T Oshima, K Kaminaga, H Mashiko, A Mukai, K Sasaki, T Masui, ...
Japanese journal of applied physics 52 (11R), 111102, 2013
622013
Growth of SnO2 crystalline thin films by mist chemical vapour deposition method
T Okuno, T Oshima, SD Lee, S Fujita
physica status solidi c 8 (2), 540-542, 2011
622011
Formation of indium–tin oxide ohmic contacts for β-Ga2O3
T Oshima, R Wakabayashi, M Hattori, A Hashiguchi, N Kawano, K Sasaki, ...
Japanese Journal of Applied Physics 55 (12), 1202B7, 2016
592016
Oxygen-radical-assisted pulsed-laser deposition of β-Ga2O3 and β-(AlxGa1− x) 2O3 films
R Wakabayashi, T Oshima, M Hattori, K Sasaki, T Masui, A Kuramata, ...
Journal of Crystal Growth 424, 77-79, 2015
572015
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