Electrical and mechanical properties of SnO2: Nb films for touch screens N Kikuchi, E Kusano, E Kishio, A Kinbara Vacuum 66 (3-4), 365-371, 2002 | 93 | 2002 |
Effects of microstructure and nonstoichiometry on electrical properties of vanadium dioxide films E Kusano, JA Theil Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 7 (3 …, 1989 | 84 | 1989 |
Thermal stability of heat‐reflective films consisting of oxide–Ag–oxide deposited by dc magnetron sputtering E Kusano, J Kawaguchi, K Enjouji Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 4 (6 …, 1986 | 81 | 1986 |
Deposition of vanadium oxide films by direct‐current magnetron reactive sputtering E Kusano, JA Theil, JA Thornton Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 6 (3 …, 1988 | 79 | 1988 |
Structure-zone modeling of sputter-deposited thin films: a brief review E Kusano Applied Science and Convergence Technology 28 (6), 179-185, 2019 | 61 | 2019 |
A smart gas sensor using polymer-film-coated quartz resonator microbalance H Nanto, N Dougami, T Mukai, M Habara, E Kusano, A Kinbara, T Ogawa, ... Sensors and Actuators B: Chemical 66 (1-3), 16-18, 2000 | 55 | 2000 |
Elastic and plastic energies in sputtered multilayered Ti–TiN films estimated by nanoindentation N Kikuchi, M Kitagawa, A Sato, E Kusano, H Nanto, A Kinbara Surface and Coatings Technology 126 (2-3), 131-135, 2000 | 55 | 2000 |
An investigation of hysteresis effects as a function of pumping speed, sputtering current, and O2/Ar ratio, in Ti‐O2 reactive sputtering processes E Kusano Journal of applied physics 70 (11), 7089-7096, 1991 | 52 | 1991 |
Evaluation of adhesion strength of Ti films on Si (100) by the internal stress method A Kinbara, E Kusano, T Kamiya, I Kondo, O Takenaka Thin Solid Films 317 (1-2), 165-168, 1998 | 51 | 1998 |
Phonon scattering in electron transport phenomena of ITO films N Kikuchi, E Kusano, H Nanto, A Kinbara, H Hosono Vacuum 59 (2-3), 492-499, 2000 | 46 | 2000 |
Titanium carbide film deposition by DC magnetron reactive sputtering using a solid carbon source E Kusano, A Satoh, M Kitagawa, H Nanto, A Kinbara Thin Solid Films 343, 254-256, 1999 | 46 | 1999 |
TiOx film formation process by reactive sputtering A Kinbara, E Kusano, S Baba Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 10 (4 …, 1992 | 45 | 1992 |
Preparation of TiC films by alternate deposition of Ti and C layers using a dual magnetron sputtering source E Kusano, A Sato, N Kikuchi, H Nanto, A Kinbara Surface and Coatings Technology 120, 378-382, 1999 | 43 | 1999 |
Vanadium reactive magnetron sputtering in mixed Ar/O2 discharges JA Theil, E Kusano, A Rockett Thin Solid Films 298 (1-2), 122-129, 1997 | 42 | 1997 |
Adhesion and hardness of compositionally gradient TiO2/Ti/TiN, ZrO2/Zr/ZrN, and TiO2/Ti/Zr/ZrN coatings E Kusano, M Kitagawa, Y Kuroda, H Nanto, A Kinbara Thin Solid Films 334 (1-2), 151-155, 1998 | 39 | 1998 |
Effects of radio-frequency plasma on structure and properties in Ti film deposition by dc and pulsed dc magnetron sputtering T Oya, E Kusano Thin Solid Films 517 (20), 5837-5843, 2009 | 35 | 2009 |
Mechanisms of carrier generation and transport in Ni-doped Cu2O N Kikuchi, K Tonooka, E Kusano Vacuum 80 (7), 756-760, 2006 | 35 | 2006 |
Hardness enhancement by compositionally modulated structure of Ti/TiN multilayer films E Kusano, M Kitagawa, H Nanto, A Kinbara Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 16 (3 …, 1998 | 35 | 1998 |
Characterization of organic polymer thin films deposited by rf magnetron sputtering T Oya, E Kusano Vacuum 83 (3), 564-568, 2008 | 34 | 2008 |
Imidized organic thin films deposited on glass substrates K Fukushima, Y Ikeda, T Hayashi, N Kikuchi, E Kusano, A Kinbara Thin solid films 392 (2), 254-257, 2001 | 32 | 2001 |