| Effects of the nearest neighbors and the alloy matrix on SiH stretching vibrations in the amorphous SiO r: H (0< r< 2) alloy system DV Tsu, G Lucovsky, BN Davidson Physical Review B 40 (3), 1795, 1989 | 525 | 1989 |
| Local atomic structure in thin films of silicon nitride and silicon diimide produced by remote plasma-enhanced chemical-vapor deposition DV Tsu, G Lucovsky, MJ Mantini Physical Review B 33 (10), 7069, 1986 | 440 | 1986 |
| Deposition of silicon dioxide and silicon nitride by remote plasma enhanced chemical vapor deposition G Lucovsky, PD Richard, DV Tsu, SY Lin, RJ Markunas Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 4 (3 …, 1986 | 398 | 1986 |
| Effect of hydrogen dilution on the structure of amorphous silicon alloys DV Tsu, BS Chao, SR Ovshinsky, S Guha, J Yang Applied Physics Letters 71 (10), 1317-1319, 1997 | 351 | 1997 |
| Plasma enhanced chemical vapor deposition: Differences between direct and remote plasma excitation G Lucovsky, DV Tsu Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 5 (4 …, 1987 | 256 | 1987 |
| Phase angle controlled stationary elements for long wavelength electromagnetic radiation D Tsu, RO Miller US Patent 6,882,460, 2005 | 242 | 2005 |
| Local bonding environments of Si–OH groups in SiO2 deposited by remote plasma‐enhanced chemical vapor deposition and incorporated by postdeposition … JA Theil, DV Tsu, MW Watkins, SS Kim, G Lucovsky Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 8 (3 …, 1990 | 214 | 1990 |
| Increased data storage in optical data storage and retrieval systems using blue lasers and/or plasmon lenses SR Ovshinsky, D Strand, D Tsu US Patent 7,113,474, 2006 | 198 | 2006 |
| Silicon nitride and silicon diimide grown by remote plasma enhanced chemical vapor deposition DV Tsu, G Lucovsky Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 4 (3 …, 1986 | 147 | 1986 |
| Remote plasma enhanced CVD deposition of silicon nitride and oxide for gate insulators in (In, Ga) As FET devices PD Richard, RJ Markunas, G Lucovsky, GG Fountain, AN Mansour, ... Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 3 (3 …, 1985 | 131 | 1985 |
| Deposition of silicon oxynitride thin films by remote plasma enhanced chemical vapor deposition DV Tsu, G Lucovsky, MJ Mantini, SS Chao Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 5 (4 …, 1987 | 110 | 1987 |
| Method for the improved microwave deposition of thin films SR Ovshinsky, DV Tsu, R Young US Patent 5,324,553, 1994 | 71 | 1994 |
| Atomic structure in SiO2 thin films deposited by remote plasma‐enhanced chemical vapor deposition G Lucovsky, JT Fitch, DV Tsu, SS Kim Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 7 (3 …, 1989 | 71 | 1989 |
| Photonic crystals and devices having tunability and switchability RO Miller, D Tsu US Patent 6,859,304, 2005 | 65 | 2005 |
| Optical emission and mass spectroscopic studies of the gas phase during the deposition of SiO2 and a‐Si:H by remote plasma‐enhanced chemical vapor deposition DV Tsu, GN Parsons, G Lucovsky, MW Watkins Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 7 (3 …, 1989 | 64 | 1989 |
| The effects of subcutaneous oxidation at the interfaces between elemental and compound semiconductors and SiO2 thin films deposited by remote plasma … G Lucovsky, SS Kim, DV Tsu, GG Fountain, RJ Markunas Journal of Vacuum Science & Technology B: Microelectronics Processing and …, 1989 | 59 | 1989 |
| Evidence for the occurrence of subcutaneous oxidation during low temperature remote plasma enhanced deposition of silicon dioxide films GG Fountain, SV Hattangady, RA Rudder, RJ Markunas, G Lucovsky, ... Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 7 (3 …, 1989 | 58 | 1989 |
| Heterogeneity in hydrogenated silicon: Evidence for intermediately ordered chainlike objects DV Tsu, BS Chao, SR Ovshinsky, SJ Jones, J Yang, S Guha, R Tsu Physical Review B 63 (12), 125338, 2001 | 52 | 2001 |
| Thin Film Processes II G Lucovsky, DV Tsu, RA Rudder, RJ Markunas, JL Vossen, W Kern Academic, Boston, 565-619, 1991 | 52* | 1991 |
| Deposition of device quality silicon dioxide thin films by remote plasma enhanced chemical vapor deposition SS Kim, DV Tsu, G Lucovsky Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 6 (3 …, 1988 | 52 | 1988 |
