| Monte Carlo simulation of 1–10‐KeV electron scattering in a gold target M Kotera, K Murata, K Nagami Journal of Applied Physics 52 (2), 997-1003, 1981 | 121 | 1981 |
| A Monte Carlo simulation of primary and secondary electron trajectories in a specimen M Kotera Journal of applied physics 65 (10), 3991-3998, 1989 | 77 | 1989 |
| A simulation of keV electron scatterings in a charged‐up specimen M Kotera, H Suga Journal of applied physics 63 (2), 261-268, 1988 | 73 | 1988 |
| A simulation of electron scattering in metals M Kotera, R Ijichi, T Fujiwara, H Suga, DB Wittry Japanese journal of applied physics 29 (10R), 2277, 1990 | 57 | 1990 |
| Dynamic simulation of electron-beam-induced chargingup of insulators M Kotera, K Yamaguchi, H Suga Japanese Journal of Applied Physics 38 (12S), 7176, 1999 | 55 | 1999 |
| Monte Carlo simulation of 1–10‐keV electron scattering in an aluminum target M Kotera, K Murata, K Nagami Journal of Applied Physics 52 (12), 7403-7408, 1981 | 51 | 1981 |
| Monte Carlo modeling of the photo and Auger electron production in x-ray lithography with synchrotron radiation K Murata, M Kotera, K Nagami, S Namba IEEE Transactions on electron devices 32 (9), 1694-1703, 1985 | 44 | 1985 |
| Quantitative electron microprobe analysis of thin films on substrates with a new Monte Carlo simulation K Murata, M Kotera, K Nagami Journal of applied physics 54 (2), 1110-1114, 1983 | 38 | 1983 |
| Monte Carlo simulation of secondary electrons in solids and its application for scanning electron microscopy M Kotera, T Kishida, H Suga Scanning Microscopy, 111-126, 1989 | 28 | 1989 |
| Three-dimensional simulation of resist pattern deformation by surface tension at the drying process M Kotera, N Ochiai Microelectronic engineering 78, 515-520, 2005 | 25 | 2005 |
| Line edge roughness of developed resist with low-dose electron beam exposure M Kotera, T Yamada, Y Ishida Japanese journal of applied physics 41 (6S), 4150, 2002 | 25 | 2002 |
| Analysis of charging effect during observation of trench structures by scanning electron microscope M Kotera, S Yamaguchi, SUS Umegaki, HSH Suga Japanese journal of applied physics 33 (12S), 7144, 1994 | 22 | 1994 |
| Time-dependent charge distributions in polymer films under electron beam irradiation M Yasuda, Y Kainuma, H Kawata, Y Hirai, Y Tanaka, R Watanabe, ... Journal of Applied Physics 104 (12), 2008 | 21 | 2008 |
| Dependence of linewidth and its edge roughness on electron beam exposure dose M Kotera, K Yagura, H Niu Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2005 | 20 | 2005 |
| Simulation of time-dependent charging of resist on Si under electron-beam irradiation M Kotera Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2001 | 20 | 2001 |
| A simulation of electron beam induced charging-up of insulators H Suga, H Tadokoro, M Kotera Electron microscopy 1, 177-178, 1998 | 20 | 1998 |
| A Simulation of the Topographic Contrast in the SEM M Kotera, T Fujiwara, H Suga, DB Wittry Japanese journal of applied physics 29 (10R), 2312, 1990 | 17 | 1990 |
| Papers from the 49th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication-Electron Beam Lithography and Imaging-Dependence of linewidth and … M Kotera, K Yagura, H Niu Journal of Vacuum Science and Technology-Section B 23 (6), 2775-2779, 2005 | 13* | 2005 |
| Computer simulation of light emission by high-energy electrons in YAG single crystals M Kotera, Y Kamiya Ultramicroscopy 54 (2-4), 293-300, 1994 | 13 | 1994 |
| Theoretical evaluation of compositional contrast of scanning electron microscope images M Kotera, S Yamaguchi, TFT Fujiwara, HSH Suga Japanese journal of applied physics 31 (12S), 4531, 1992 | 12 | 1992 |
