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Kevin Matney
Kevin Matney
Jordan Valley Semiconductor
在 jvsemi.com 的电子邮件经过验证
标题
引用次数
引用次数
年份
Characterization of structures from X-ray scattering data using genetic algorithms
M Wormington, C Panaccione, KM Matney, DK Bowen
Philosophical Transactions of the Royal Society of London. Series A …, 1999
4211999
Fitting of X-ray scattering data using evolutionary algorithms
M Wormington, C Panaccione, KM Matney, DK Bowen
US Patent 6,192,103, 2001
642001
Processing technologies for advanced Ge devices
R Loo, AY Hikavyy, L Witters, A Schulze, H Arimura, D Cott, J Mitard, ...
ECS Journal of Solid State Science and Technology 6 (1), P14, 2016
412016
Annealing effects on the temperature dependence of photoluminescence characteristics of GaAsSbN single-quantum wells
J Li, S Iyer, S Bharatan, L Wu, K Nunna, W Collis, KK Bajaj, K Matney
Journal of applied physics 98 (1), 2005
322005
The effects of annealing on the structural, optical, and vibrational properties of lattice-matched GaAsSbN∕ GaAs grown by molecular beam epitaxy
S Bharatan, S Iyer, K Nunna, WJ Collis, K Matney, J Reppert, AM Rao, ...
Journal of Applied Physics 102 (2), 2007
272007
MBE growth and properties of GaAsSbN/GaAs single quantum wells
L Wu, S Iyer, K Nunna, J Li, S Bharatan, W Collis, K Matney
Journal of crystal growth 279 (3-4), 293-302, 2005
272005
Effect of substrate miscut on the structural properties of InGaAs linear graded buffer layers grown by molecularbeam epitaxy on GaAs
JW Eldredge, KM Matney, MS Goorsky, HC Chui, JS Harris Jr
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1995
251995
Scans along arbitrary directions in reciprocal space and the analysis of GaN films on SiC
B Poust, B Heying, S Hayashi, R Ho, K Matney, R Sandhu, M Wojtowicz, ...
Journal of Physics D: Applied Physics 38 (10A), A93, 2005
222005
Effects of N incorporation on the structural and photoluminescence characteristics of GaSbN/GaSb single quantum wells
S Iyer, L Wu, J Li, S Potoczny, K Matney, PRC Kent
Journal of applied physics 101 (11), 2007
192007
Reciprocal space mapping for semiconductor substrates and device heterostructures
MS Goorsky, KM Matney, M Meshkinpour, DC Streit, TR Block
Il Nuovo Cimento D 19, 257-266, 1997
151997
Measurement of periodicity and strain in arrays of single crystal silicon and pseudomorphic Si1− xGex/Si fin structures using x-ray reciprocal space maps
M Medikonda, GR Muthinti, J Fronheiser, V Kamineni, M Wormington, ...
Journal of Vacuum Science & Technology B 32 (2), 2014
142014
Characterization of buried pseudomorphic InGaAs layers using highresolution xray diffraction
M Meshkinpour, MS Goorsky, KM Matney, DC Streit, TR Block
Journal of applied physics 76 (6), 3362-3366, 1994
141994
Preservation of rectangular-patterned InP gratings overgrown by gas source molecular beam epitaxy
EM Koontz, MH Lim, VV Wong, GS Petrich, LA Kolodziejski, HI Smith, ...
Applied physics letters 71 (10), 1400-1402, 1997
101997
Determining period variations in a distributed Bragg reflector through high resolution X-ray analysis
K Matney, MS Goorsky
Journal of crystal growth 148 (4), 327-335, 1995
91995
Correlation of interface recombination and dislocation density at GalnP/GaAs heterojunctions
M Müllenborn, K Matney, MS Goorsky, NM Haegel, SM Vernon
Journal of applied physics 75 (5), 2418-2420, 1994
91994
Growth and properties of lattice matched GaAsSbN epilayer on GaAs for solar cell applications
S Bharatan, S Iyer, K Matney, WJ Collis, K Nunna, J Li, L Wu, K McGuire, ...
MRS Online Proceedings Library (OPL) 891, 0891-EE10-36, 2005
82005
Inline metrology of high aspect ratio hole tilt and center line shift using small-angle x-ray scattering
P Gin, M Wormington, Y Amasay, I Grinberg, A Brady, I Reichental, ...
Journal of Micro/Nanopatterning, Materials, and Metrology 22 (3), 031205-031205, 2023
72023
Image contrast in X-ray topography imaging for defect inspection
KM Matney, O Whear, RT Bytheway, JL Wall, M Wormington
US Patent 10,816,487, 2020
72020
A new approach for determining epilayer strain relaxation and composition through high resolution X-ray diffraction
KM Matney, MS Goorsky
MRS Online Proceedings Library 379, 257-262, 1995
71995
Materials characterization for process integration of multi-channel gate all around (GAA) devices
GR Muthinti, N Loubet, R Chao, AA de la Peña, J Li, MA Guillorn, ...
Metrology, Inspection, and Process Control for Microlithography XXXI 10145 …, 2017
62017
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