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Jean-Paul Booth
Jean-Paul Booth
Research Director, LPP-CNRS
Verified email at lpp.polytechnique.fr - Homepage
Title
Cited by
Cited by
Year
Standing wave and skin effects in large-area, high-frequency capacitive discharges
MA Lieberman, JP Booth, P Chabert, JM Rax, MM Turner
Plasma Sources Science and Technology 11 (3), 283, 2002
3822002
production and loss mechanisms in fluorocarbon discharges: Fluorine-poor conditions and polymerization
G Cunge, JP Booth
Journal of Applied Physics 85 (8), 3952-3959, 1999
2211999
Oxygen and fluorine atom kinetics in electron cyclotron resonance plasmas by time‐resolved actinometry
JP Booth, N Sadeghi
Journal of applied physics 70 (2), 611-620, 1991
2001991
A novel electrostatic probe method for ion flux measurements
NSJ Braithwaite, JP Booth, G Cunge
Plasma Sources Science and Technology 5 (4), 677, 1996
1911996
radical production and loss in a reactive ion etching plasma: Fluorine rich conditions
JP Booth, G Cunge, P Chabert, N Sadeghi
Journal of Applied Physics 85 (6), 3097-3107, 1999
1901999
Spatially and temporally resolved laser‐induced fluorescence measurements of CF2 and CF radicals in a CF4 rf plasma
JP Booth, G Hancock, ND Perry, MJ Toogood
Journal of applied physics 66 (11), 5251-5257, 1989
1871989
Oxygen atom actinometry reinvestigated: Comparison with absolute measurements by resonance absorption at 130 nm
JP Booth, O Joubert, J Pelletier, N Sadeghi
Journal of applied physics 69 (2), 618-626, 1991
1521991
Ion flux nonuniformities in large-area high-frequency capacitive discharges
A Perret, P Chabert, JP Booth, J Jolly, J Guillon, P Auvray
Applied physics letters 83 (2), 243-245, 2003
1432003
Electron beam pulses produced by helicon‐wave excitation
AR Ellingboe, RW Boswell, JP Booth, N Sadeghi
Physics of Plasmas 2 (6), 1807-1809, 1995
1311995
Strong ionization asymmetry in a geometrically symmetric radio frequency capacitively coupled plasma induced by sawtooth voltage waveforms
B Bruneau, T Gans, D O’Connell, A Greb, EV Johnson, JP Booth
Physical review letters 114 (12), 125002, 2015
1202015
Ion energy uniformity in high-frequency capacitive discharges
A Perret, P Chabert, J Jolly, JP Booth
Applied Physics Letters 86 (2), 2005
1142005
Absolute radical densities in etching plasmas determined by broad-band UV absorption spectroscopy
JP Booth, G Cunge, F Neuilly, N Sadeghi
Plasma Sources Science and Technology 7 (3), 423, 1998
1081998
Optical and electrical diagnostics of fluorocarbon plasma etching processes
JP Booth
Plasma Sources Science and Technology 8 (2), 249, 1999
1061999
Electron heating in capacitively coupled plasmas revisited
T Lafleur, P Chabert, JP Booth
Plasma Sources Science and Technology 23 (3), 035010, 2014
1022014
Separate control of the ion flux and ion energy in capacitively coupled radio-frequency discharges using voltage waveform tailoring
T Lafleur, PA Delattre, EV Johnson, JP Booth
Applied Physics Letters 101 (12), 2012
952012
Dual-frequency capacitive radiofrequency discharges: effect of low-frequency power on electron density and ion flux
JP Booth, G Curley, D Marić, P Chabert
Plasma Sources Science and Technology 19 (1), 015005, 2009
932009
Laser induced fluorescence detection of CF and CF2 radicals in a CF4/O2 plasma
JP Booth, G Hancock, ND Perry
Applied physics letters 50 (6), 318-319, 1987
931987
Enhanced sheath heating in capacitively coupled discharges due to non-sinusoidal voltage waveforms
T Lafleur, RW Boswell, JP Booth
Applied Physics Letters 100 (19), 2012
922012
Secondary electron induced asymmetry in capacitively coupled plasmas
T Lafleur, P Chabert, JP Booth
Journal of Physics D: Applied Physics 46 (13), 135201, 2013
812013
Nanocrystalline silicon film growth morphology control through RF waveform tailoring
EV Johnson, T Verbeke, JC Vanel, JP Booth
Journal of Physics D: Applied Physics 43 (41), 412001, 2010
812010
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