MANUFACTURING METHOD OF A SEMICONDUCTOR DEVICE AND METHOD FOR CREATING A LAYOUT THEREOF K Yanagidaira, C Kodama US Patent 20,090,155,990, 2009 | 154 | 2009 |
Self-aligned double and quadruple patterning-aware grid routing with hotspots control C Kodama, H Ichikawa, K Nakayama, T Kotani, S Nojima, S Mimotogi, ... 2013 18th Asia and South Pacific Design Automation Conference (ASP-DAC), 267-272, 2013 | 44 | 2013 |
A machine learning based framework for sub-resolution assist feature generation X Xu, T Matsunawa, S Nojima, C Kodama, T Kotani, DZ Pan Proceedings of the 2016 on International Symposium on Physical Design, 161-168, 2016 | 43 | 2016 |
Selected sequence-pair: An efficient decodable packing representation in linear time using sequence-pair C Kodama, K Fujiyoshi Proceedings of the 2003 Asia and South Pacific Design Automation Conference …, 2003 | 39 | 2003 |
Self-aligned double and quadruple patterning layout principle K Nakayama, C Kodama, T Kotani, S Nojima, S Mimotogi, S Miyamoto Design for Manufacturability through Design-Process Integration VI 8327, 252-260, 2012 | 36 | 2012 |
Subresolution assist feature generation with supervised data learning X Xu, Y Lin, M Li, T Matsunawa, S Nojima, C Kodama, T Kotani, DZ Pan IEEE Transactions on Computer-Aided Design of Integrated Circuits and …, 2017 | 29 | 2017 |
Improved method of cell placement with symmetry constraints for analog IC layout design S Kouda, C Kodama, K Fujiyoshi Proceedings of the 2006 international symposium on Physical design, 192-199, 2006 | 29 | 2006 |
Lithography hotspot detection by two-stage cascade classifier using histogram of oriented light propagation Y Tomioka, T Matsunawa, C Kodama, S Nojima 2017 22nd Asia and South Pacific Design Automation Conference (ASP-DAC), 81-86, 2017 | 28 | 2017 |
A fast process variation and pattern fidelity aware mask optimization algorithm A Awad, A Takahashi, S Tanaka, C Kodama 2014 IEEE/ACM International Conference on Computer-Aided Design (ICCAD), 238-245, 2014 | 28 | 2014 |
Method for manufacturing semiconductor device H Mashita, T Kotani, H Mukai, F Nakajima, C Kodama US Patent 7,713,833, 2010 | 28 | 2010 |
Linear programming-based cell placement with symmetry constraints for analog IC layout S Koda, C Kodama, K Fujiyoshi IEEE Transactions on Computer-Aided Design of Integrated Circuits and …, 2007 | 26 | 2007 |
Semiconductor device and method of manufacturing the same F Nakajima, T Kotani, H Mashita, T Taguchi, R Aburada, C Kodama US Patent App. 13/234,052, 2012 | 20 | 2012 |
Sub-resolution assist feature arranging method and computer program product and manufacturing method of semiconductor device C Kodama, T Kotani, S Nojima, S Mimotogi US Patent 8,809,072, 2014 | 19 | 2014 |
Mask-layout creating method, apparatus therefor, and computer program product K Kodera, C Kodama US Patent 8,336,006, 2012 | 19 | 2012 |
Nonvolatile semiconductor storage device and method of manufacturing the same R Aburada, T Kotani, T Taguchi, C Kodama US Patent App. 12/858,986, 2011 | 18 | 2011 |
Semiconductor device C Kodama, M Ito US Patent 7,777,348, 2010 | 18 | 2010 |
Self-Aligned Double and Quadruple Patterning Aware Grid Routing Methods C Kodama, H Ichikawa, K Nakayama, F Nakajima, S Nojima, T Kotani, ... IEEE Transactions on Computer Aided Design of Integrated Circuits and …, 2015 | 17 | 2015 |
Fast mask assignment using positive semidefinite relaxation in LELECUT triple patterning lithography Y Kohira, T Matsui, Y Yokoyama, C Kodama, A Takahashi, S Nojima, ... The 20th Asia and South Pacific Design Automation Conference, 665-670, 2015 | 14 | 2015 |
Method of fabricating semiconductor device and semiconductor device R Aburada, H Mashita, T Kotani, C Kodama US Patent 8,183,148, 2012 | 14 | 2012 |
A fast process-variation-aware mask optimization algorithm with a novel intensity modeling A Awad, A Takahashi, S Tanaka, C Kodama IEEE Transactions on Very Large Scale Integration (VLSI) Systems 25 (3), 998 …, 2016 | 13 | 2016 |