フォロー
Patrick D Lomenzo
Patrick D Lomenzo
Nanoelectronic Materials Laboratory, NaMLab
確認したメール アドレス: namlab.com
タイトル
引用先
引用先
Next generation ferroelectric materials for semiconductor process integration and their applications
T Mikolajick, S Slesazeck, H Mulaosmanovic, MH Park, S Fichtner, ...
Journal of Applied Physics 129 (10), 2021
2422021
TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
PD Lomenzo, Q Takmeel, C Zhou, CM Fancher, E Lambers, ...
Journal of Applied Physics 117 (13), 2015
1882015
Origin of Ferroelectric Phase in Undoped HfO2 Films Deposited by Sputtering
T Mittmann, M Materano, PD Lomenzo, MH Park, I Stolichnov, M Cavalieri, ...
Advanced Materials Interfaces 6 (11), 1900042, 2019
1772019
Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
PD Lomenzo, P Zhao, Q Takmeel, S Moghaddam, T Nishida, M Nelson, ...
Journal of Vacuum Science & Technology B 32 (3), 2014
1372014
Review of defect chemistry in fluorite-structure ferroelectrics for future electronic devices
MH Park, DH Lee, K Yang, JY Park, GT Yu, HW Park, M Materano, ...
Journal of Materials Chemistry C 8 (31), 10526-10550, 2020
1202020
Doped Hf0. 5Zr0. 5O2 for high efficiency integrated supercapacitors
PD Lomenzo, CC Chung, C Zhou, JL Jones, T Nishida
Applied Physics Letters 110 (23), 2017
992017
Depolarization as driving force in antiferroelectric hafnia and ferroelectric wake-up
PD Lomenzo, C Richter, T Mikolajick, U Schroeder
ACS Applied Electronic Materials 2 (6), 1583-1595, 2020
822020
Annealing behavior of ferroelectric Si-doped HfO2 thin films
PD Lomenzo, Q Takmeel, S Moghaddam, T Nishida
Thin Solid Films 615, 139-144, 2016
822016
Interplay between oxygen defects and dopants: effect on structure and performance of HfO 2-based ferroelectrics
M Materano, PD Lomenzo, A Kersch, MH Park, T Mikolajick, U Schroeder
Inorganic Chemistry Frontiers 8 (10), 2650-2672, 2021
802021
Influence of Oxygen Content on the Structure and Reliability of Ferroelectric HfxZr1–xO2 Layers
M Materano, T Mittmann, PD Lomenzo, C Zhou, JL Jones, M Falkowski, ...
ACS Applied Electronic Materials 2 (11), 3618-3626, 2020
792020
Ferroelectric Si-Doped HfO2 Device Properties on Highly Doped Germanium
PD Lomenzo, Q Takmeel, CM Fancher, C Zhou, NG Rudawski, ...
IEEE Electron Device Letters 36 (8), 766-768, 2015
792015
Fluid Imprint and Inertial Switching in Ferroelectric La:HfO2 Capacitors
P Buragohain, A Erickson, P Kariuki, T Mittmann, C Richter, PD Lomenzo, ...
ACS applied materials & interfaces 11 (38), 35115-35121, 2019
772019
Bulk Depolarization Fields as a Major Contributor to the Ferroelectric Reliability Performance in Lanthanum Doped Hf0.5Zr0.5O2 Capacitors
F Mehmood, M Hoffmann, PD Lomenzo, C Richter, M Materano, ...
Advanced Materials Interfaces 6 (21), 1901180, 2019
752019
Recent progress for obtaining the ferroelectric phase in hafnium oxide based films: impact of oxygen and zirconium
U Schroeder, M Materano, T Mittmann, PD Lomenzo, T Mikolajick, ...
Japanese Journal of Applied Physics 58 (SL), SL0801, 2019
722019
The effects of layering in ferroelectric Si-doped HfO2 thin films
PD Lomenzo, Q Takmeel, C Zhou, Y Liu, CM Fancher, JL Jones, ...
Applied Physics Letters 105 (7), 2014
652014
Polarization switching in thin doped HfO2 ferroelectric layers
M Materano, PD Lomenzo, H Mulaosmanovic, M Hoffmann, A Toriumi, ...
Applied Physics Letters 117 (26), 2020
612020
Material perspectives of HfO2-based ferroelectric films for device applications
A Toriumi, L Xu, Y Mori, X Tian, PD Lomenzo, H Mulaosmanovic, ...
2019 IEEE International Electron Devices Meeting (IEDM), 15.1. 1-15.1. 4, 2019
452019
Stabilizing the ferroelectric phase in HfO 2-based films sputtered from ceramic targets under ambient oxygen
T Mittmann, M Michailow, PD Lomenzo, J Gärtner, M Falkowski, A Kersch, ...
Nanoscale 13 (2), 912-921, 2021
442021
Mixed Al and Si doping in ferroelectric HfO2 thin films
PD Lomenzo, Q Takmeel, C Zhou, CC Chung, S Moghaddam, JL Jones, ...
Applied Physics Letters 107 (24), 2015
432015
Universal Curie constant and pyroelectricity in doped ferroelectric HfO2 thin films
PD Lomenzo, S Jachalke, H Stoecker, E Mehner, C Richter, T Mikolajick, ...
Nano Energy 74, 104733, 2020
372020
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