| Substrate treating apparatus and substrate treating method Y Sasaki, Y Hanawa, S Nadahara, D Ueda, H Kitagawa, K Okumura US Patent 10,153,181, 2018 | 17 | 2018 |
| Substrate cleaning method and substrate cleaning apparatus Y Sasaki, Y Hanawa, K Miya US Patent 10,286,425, 2019 | 9 | 2019 |
| Substrate treating method and substrate treating apparatus Y Hanawa, Y Sasaki US Patent 10,699,920, 2020 | 6 | 2020 |
| Multi-scale analysis for solidification of phase change materials (PCMs): Experiments and modeling M Xu, Y Hanawa, S Akhtar, A Sakuma, J Zhang, J Yoshida, M Sanada, ... International Journal of Heat and Mass Transfer 212, 124182, 2023 | 4 | 2023 |
| Breakthrough of Sublimation Drying by Liquid Phase Deposition Y Sasaki, Y Hanawa, M Otsuji, N Fujiwara, M Kato, Y Yamaguchi, ... Solid State Phenomena 314, 172-177, 2021 | 4 | 2021 |
| Effect of Hydrophobicity and Surface Potential of Silicon on SiO2 Etching in Nanometer-Sized Narrow Spaces D Ueda, Y Hanawa, H Kitagawa, N Fujiwara, M Otsuji, H Takahashi, ... Solid State Phenomena 314, 155-160, 2021 | 4 | 2021 |
| Substrate treating method and substrate treating apparatus Y Hanawa, Y Sasaki US Patent App. 16/037,016, 2019 | 4 | 2019 |
| Vapor supplying apparatus, vapor drying apparatus, vapor supplying method, and vapor drying method Y Hanawa, K Miya US Patent 9,976,804, 2018 | 4 | 2018 |
| Thermomechanical formulation of freezing point depression behavior of liquid on solid surface with nanostructure Y Hanawa, Y Sasaki, S Uchida, T Funayoshi, M Otsuji, H Takahashi, ... ASME International Mechanical Engineering Congress and Exposition 84591 …, 2020 | 3 | 2020 |
| Substrate cleaning method and substrate cleaning apparatus Y Hanawa, K Miya, Y Sasaki US Patent 9,728,396, 2017 | 3 | 2017 |
| Substrate processing method and substrate processing device D Ueda, Y Sasaki, Y Hanawa, H Kitagawa US Patent 11,897,009, 2024 | 2 | 2024 |
| Substrate treating method and apparatus used therefor Y Sasaki, Y Hanawa, S Kunieda US Patent App. 17/893,750, 2023 | 1 | 2023 |
| Model potential of dimer system and coherence length of electron injected by scanning tunneling microscope on Ge (0 0 1) surface H Kawai, Y Yoshimoto, O Narikiyo, Y Hanawa, A Imamura Surface science 602 (18), 3010-3017, 2008 | 1 | 2008 |
| Substrate treating method, substrate treating apparatus and substrate treating liquid S Kunieda, Y Sasaki, Y Hanawa US Patent App. 18/452,977, 2024 | | 2024 |
| Substrate processing liquid for etching a metal layer, substrate processing method and substrate processing apparatus D Ueda, Y Hanawa US Patent 11,908,938, 2024 | | 2024 |
| Kinetics formulation for Two-Dimensional Growth Behavior of Water/Ice Interface on Si Substrate Y Hanawa, J Zhang, AP Sasmito, M Xu, S Akhtar, M Mohit, J Yoshida, ... Langmuir, 2024 | | 2024 |
| Learning device, information processing apparatus, substrate processing device, substrate processing system, learning method, recipe determination method and non-transitory … Y Hanawa, Y Sasaki, S Kunieda US Patent App. 17/878,242, 2023 | | 2023 |
| Substrate drying method and substrate drying apparatus Y Hanawa, Y Sasaki US Patent 11,158,523, 2021 | | 2021 |
| Substrate treating method and substrate treating apparatus Y Hanawa, D Ueda, Y Sasaki US Patent 11,133,175, 2021 | | 2021 |
| Substrate treating method, substrate treating liquid and substrate treating apparatus Y Sasaki, Y Hanawa US Patent 11,094,565, 2021 | | 2021 |
Saad AkhtarStaff Researcher, National Renewable Energy Laboratory確認したメール アドレス: nrel.gov
