| Mask design for optical microlithography—an inverse imaging problem A Poonawala, P Milanfar IEEE Transactions on Image Processing 16 (3), 774-788, 2007 | 242 | 2007 |
| OPC and PSM design using inverse lithography: a nonlinear optimization approach A Poonawala, P Milanfar Optical Microlithography XIX 6154, 1159-1172, 2006 | 93 | 2006 |
| Double-exposure mask synthesis using inverse lithography A Poonawala, P Milanfar Journal of Micro/Nanolithography, MEMS and MOEMS 6 (4), 043001-043001-9, 2007 | 36 | 2007 |
| A pixel-based regularization approach to inverse lithography A Poonawala, P Milanfar Microelectronic Engineering 84 (12), 2837-2852, 2007 | 31 | 2007 |
| Prewarping techniques in imaging: applications in nanotechnology and biotechnology A Poonawala, P Milanfar Computational Imaging III 5674, 114-127, 2005 | 30 | 2005 |
| ILT for double exposure lithography with conventional and novel materials A Poonawala, Y Borodovsky, P Milanfar Optical Microlithography XX 6520, 996-1009, 2007 | 27 | 2007 |
| Simultaneous source-mask optimization: a numerical combining method T Mülders, V Domnenko, B Küchler, T Klimpel, HJ Stock, AA Poonawala, ... Photomask Technology 2010 7823, 997-1008, 2010 | 24 | 2010 |
| Establishing fast, practical, full-chip ILT flows using machine learning T Cecil, K Braam, A Omran, A Poonawala, J Shu, C Vandam Optical Microlithography XXXIII 11327, 12-29, 2020 | 18 | 2020 |
| Shape estimation from support and diameter functions A Poonawala, P Milanfar, RJ Gardner Journal of Mathematical Imaging and Vision 24 (2), 229-244, 2006 | 17 | 2006 |
| Assist feature placement based on a focus-sensitive cost-covariance field LD Barnes, BD Painter, Q Yan, Y Fan, J Li, A Poonawala US Patent 7,954,071, 2011 | 14 | 2011 |
| Model-based assist feature placement using inverse imaging approach AA Poonawala, BD Painter, LD Barnes US Patent 8,010,913, 2011 | 11 | 2011 |
| Source mask optimization for advanced lithography nodes A Poonawala, W Stanton, C Sawh Optical Microlithography XXIII 7640, 613-622, 2010 | 11 | 2010 |
| Suppressing ringing effects from very strong off-axis illumination with novel OPC approaches for low k1 lithography C Cork, F Amoroso, A Poonawala, S Jang, K Lucas Optical Microlithography XXIII 7640, 507-517, 2010 | 10 | 2010 |
| Mask design for single and double exposure optical microlithography: an inverse imaging approach A Poonawala University of California, Santa Cruz, 2007 | 10 | 2007 |
| A statistical analysis of shape reconstruction from areas of shadows A Poonawala, P Milanfar, RJ Gardner Conference Record of the Thirty-Sixth Asilomar Conference on Signals …, 2002 | 10 | 2002 |
| Model-based assist feature placement: an inverse imaging approach A Poonawala, B Painter, J Mayhew Photomask Technology 2008 7122, 277-286, 2008 | 7 | 2008 |
| Machine learning ILT for memory customers T Cecil, K Braam, A Omran, A Poonawala, J Shu, C Vandam Optical Microlithography XXXIV 11613, 153-159, 2021 | 5 | 2021 |
| Rigorous ILT optimization for advanced patterning and design-process co-optimization K Selinidis, B Kuechler, H Cai, K Braam, W Hoppe, V Domnenko, ... Optical Microlithography XXXI 10587, 174-183, 2018 | 5 | 2018 |
| Model-based assist feature placement for 32nm and 22nm technology nodes using inverse mask technology A Poonawala, B Painter, C Kerchner Photomask Technology 2009 7488, 317-328, 2009 | 5 | 2009 |
| Process window and integration results for full-chip model-based assist-feature placement at the 32 nm node and below J Li, G Luk-Pat, A Poonawala, K Lucas, B Painter Optical Microlithography XXIII 7640, 714-722, 2010 | 3 | 2010 |
Peyman MilanfarDistinguished Scientist, Google確認したメール アドレス: google.com
Peyman MilanfarDistinguished Scientist, Google確認したメール アドレス: google.com