Mark J. Kushner
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引用先
引用先
A model for the discharge kinetics and plasma chemistry during plasma enhanced chemical vapor deposition of amorphous silicon
MJ Kushner
Journal of applied physics 63 (8), 2532-2551, 1988
6011988
Plasma–liquid interactions: a review and roadmap
PJ Bruggeman, MJ Kushner, BR Locke, JGE Gardeniers, WG Graham, ...
Plasma sources science and technology 25 (5), 053002, 2016
5552016
The 2012 plasma roadmap
S Samukawa, M Hori, S Rauf, K Tachibana, P Bruggeman, G Kroesen, ...
Journal of Physics D: Applied Physics 45 (25), 253001, 2012
5192012
A model for plasma modification of polypropylene using atmospheric pressure discharges
R Dorai, MJ Kushner
Journal of Physics D: Applied Physics 36 (6), 666, 2003
4132003
The gaseous electronics conference radio‐frequency reference cell: A defined parallel‐plate radio‐frequency system for experimental and theoretical studies of plasma‐processing …
PJ Hargis Jr, KE Greenberg, PA Miller, JB Gerardo, JR Torczynski, ...
Review of Scientific Instruments 65 (1), 140-154, 1994
4111994
Two‐dimensional modeling of high plasma density inductively coupled sources for materials processing
PLG Ventzek, RJ Hoekstra, MJ Kushner
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1994
3791994
The 2017 Plasma Roadmap: Low temperature plasma science and technology
I Adamovich, SD Baalrud, A Bogaerts, PJ Bruggeman, M Cappelli, ...
Journal of Physics D: Applied Physics 50 (32), 323001, 2017
3522017
Numerical investigation of the kinetics and chemistry of rf glow discharge plasmas sustained in He, N2, O2, He/N2/O2, He/CF4/O2, and SiH4/NH3 using a …
TJ Sommerer, MJ Kushner
Journal of applied physics 71 (4), 1654-1673, 1992
2881992
Hybrid modelling of low temperature plasmas for fundamental investigations and equipment design
MJ Kushner
Journal of Physics D: Applied Physics 42 (19), 194013, 2009
2802009
Dynamics of a coplanar-electrode plasma display panel cell. I. Basic operation
S Rauf, MJ Kushner
Journal of applied physics 85 (7), 3460-3469, 1999
2791999
Modelling of microdischarge devices: plasma and gas dynamics
MJ Kushner
Journal of Physics D: Applied Physics 38 (11), 1633, 2005
2672005
production in mixtures in flowing low pressure plasmas
DS Stafford, MJ Kushner
Journal of Applied Physics 96 (5), 2451-2465, 2004
2622004
Large‐bore copper‐vapor lasers: Kinetics and scaling issues
MJ Kushner, BE Warner
Journal of Applied Physics 54 (6), 2970-2982, 1983
2571983
Reaction chemistry and optimization of plasma remediation of NxOy from gas streams
AC Gentile, MJ Kushner
Journal of applied physics 78 (3), 2074-2085, 1995
2481995
Plasma remediation of trichloroethylene in silent discharge plasmas
D Evans, LA Rosocha, GK Anderson, JJ Coogan, MJ Kushner
Journal of applied physics 74 (9), 5378-5386, 1993
2441993
Atmospheric pressure dielectric barrier discharges interacting with liquid covered tissue
W Tian, MJ Kushner
Journal of Physics D: Applied Physics 47 (16), 165201, 2014
2352014
Distribution of ion energies incident on electrodes in capacitively coupled rf discharges
MJ Kushner
Journal of applied physics 58 (11), 4024-4031, 1985
2311985
Monte‐Carlo simulation of electron properties in rf parallel plate capacitively coupled discharges
MJ Kushner
Journal of applied physics 54 (9), 4958-4965, 1983
2101983
Removal of SO2 from gas streams using a dielectric barrier discharge and combined plasma photolysis
MB Chang, JH Balbach, MJ Rood, MJ Kushner
Journal of applied physics 69 (8), 4409-4417, 1991
2051991
Two‐dimensional hybrid model of inductively coupled plasma sources for etching
PLG Ventzek, TJ Sommerer, RJ Hoekstra, MJ Kushner
Applied physics letters 63 (5), 605-607, 1993
1941993
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論文 1–20