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adrian powell
adrian powell
cree
確認したメール アドレス: cree.com
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引用先
引用先
SiC materials-progress, status, and potential roadblocks
AR Powell, LB Rowland
Proceedings of the IEEE 90 (6), 942-955, 2002
2982002
Substrate for tensilely strained semiconductor
BA Ek, SS Iyer, PM Pitner, AR Powell, MJ Tejwani
US Patent 5,461,243, 1995
2881995
New approach to the growth of low dislocation relaxed SiGe material
AR Powell, SS Iyer, FK LeGoues
Applied physics letters 64 (14), 1856-1858, 1994
2671994
Production of substrate for tensilely strained semiconductor
BA Ek, SS Iyer, PM Pitner, AR Powell, MJ Tejwani
US Patent 5,759,898, 1998
2041998
Carrier concentration and lattice absorption in bulk and epitaxial silicon carbide determined using infrared ellipsometry
TE Tiwald, JA Woollam, S Zollner, J Christiansen, RB Gregory, ...
Physical Review B 60 (16), 11464, 1999
1831999
Surface roughening in ion implanted 4H-silicon carbide
MA Capano, S Ryu, JA Cooper, MR Melloch, K Rottner, S Karlsson, ...
Journal of Electronic Materials 28, 214-218, 1999
1831999
Recent progress in SiC DMOSFETs and JBS diodes at Cree
RJ Callanan, A Agarwal, A Burk, M Das, B Hull, F Husna, A Powell, ...
2008 34th Annual Conference of IEEE Industrial Electronics, 2885-2890, 2008
1292008
Si1-x-yGexCy growth and properties of the ternary system
AR Powell, K Eberl, BA Ek, SS Iyer
Journal of crystal growth 127 (1-4), 425-429, 1993
1141993
Performance and stability of large-area 4H-SiC 10-kV junction barrier Schottky rectifiers
BA Hull, JJ Sumakeris, MJ O'Loughlin, Q Zhang, J Richmond, AR Powell, ...
IEEE Transactions on Electron Devices 55 (8), 1864-1870, 2008
1092008
High-purity semi-insulating 4H-SiC grown by the seeded-sublimation method
JR Jenny, SG Müller, A Powell, VF Tsvetkov, HM Hobgood, RC Glass, ...
Journal of electronic materials 31, 366-369, 2002
892002
Bulk crystal growth, epitaxy, and defect reduction in silicon carbide materials for microwave and power devices
JJ Sumakeris, JR Jenny, AR Powell
MRS bulletin 30 (4), 280-286, 2005
842005
Development of large diameter high-purity semi-insulating 4H-SiC wafers for microwave devices
JR Jenny, DP Malta, MR Calus, SG Müller, AR Powell, VF Tsvetkov, ...
Materials Science Forum 457, 35-40, 2004
83*2004
Ge segregation in SiGe/Si heterostructures and its dependence on deposition technique and growth atmosphere
DA Grützmacher, TO Sedgwick, A Powell, M Tejwani, SS Iyer, J Cotte, ...
Applied physics letters 63 (18), 2531-2533, 1993
831993
Bulk growth of large area SiC crystals
AR Powell, JJ Sumakeris, Y Khlebnikov, MJ Paisley, RT Leonard, ...
Materials Science Forum 858, 5-10, 2016
772016
Drift-free, 50 A, 10 kV 4H-SiC PiN diodes with improved device yields
MK Das, JJ Sumakeris, BA Hull, J Richmond, S Krishnaswami, AR Powell
Materials Science Forum 483, 965-968, 2005
672005
100 mm 4HN-SiC wafers with zero micropipe density
RT Leonard, Y Khlebnikov, AR Powell, C Basceri, MF Brady, I Khlebnikov, ...
Materials Science Forum 600, 7-10, 2009
622009
Formation of β‐SiC nanocrystals by the relaxation of Si1−yCy random alloy layers
AR Powell, FK LeGoues, SS Iyer
Applied physics letters 64 (3), 324-326, 1994
611994
High-purity semi-insulating 4H-SiC for microwave device applications
JR Jenny, DP Malta, SG Müller, AR Powell, VF Tsvetkov, HMD Hobgood, ...
Journal of electronic materials 32, 432-436, 2003
592003
Relaxation of SiGe thin films grown on Si/SiO2 substrates
FK LeGoues, A Powell, SS Iyer
Journal of applied physics 75 (11), 7240-7246, 1994
581994
Three inch silicon carbide wafer with low warp, bow, and TTV
A Powell, WH Brixius, RT Leonard, DA McClure, M Laughner
US Patent 7,422,634, 2008
572008
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