Measure of genuine multipartite entanglement with computable lower bounds ZH Ma, ZH Chen, JL Chen, C Spengler, A Gabriel, M Huber Physical Review A 83 (6), 62325, 2011 | 265 | 2011 |

Entanglement detection via mutually unbiased bases C Spengler, M Huber, S Brierley, T Adaktylos, BC Hiesmayr Physical Review A 86 (2), 022311, 2012 | 215 | 2012 |

A composite parameterization of unitary groups, density matrices and subspaces C Spengler, M Huber, BC Hiesmayr Journal of Physics A: Mathematical and Theoretical 43 (38), 385306, 2010 | 75 | 2010 |

Composite parameterization and Haar measure for all unitary and special unitary groups C Spengler, M Huber, BC Hiesmayr Journal of Mathematical Physics 53, 013501, 2012 | 67 | 2012 |

Heisenberg’s uncertainty relation and bell inequalities in high energy physics: an effective formalism for unstable two-state systems A Di Domenico, A Gabriel, BC Hiesmayr, F Hipp, M Huber, G Krizek, ... Foundations of Physics 42, 778-802, 2012 | 36 | 2012 |

Experimentally implementable criteria revealing substructures of genuine multipartite entanglement M Huber, H Schimpf, A Gabriel, C Spengler, D Bruß, BC Hiesmayr Physical Review A 83 (2), 022328, 2011 | 29 | 2011 |

Lorentz invariance of entanglement classes in multipartite systems M Huber, N Friis, A Gabriel, C Spengler, BC Hiesmayr Europhysics Letters 95 (2), 20002, 2011 | 28 | 2011 |

Graph-state formalism for mutually unbiased bases C Spengler, B Kraus Physical Review A—Atomic, Molecular, and Optical Physics 88 (5), 052323, 2013 | 21 | 2013 |

A geometric comparison of entanglement and quantum nonlocality in discrete systems C Spengler, M Huber, BC Hiesmayr Journal of Physics A: Mathematical and Theoretical 44, 065304, 2011 | 21 | 2011 |

Examining the dimensionality of genuine multipartite entanglement C Spengler, M Huber, A Gabriel, BC Hiesmayr Quantum Information Processing 12 (1), 269, 2013 | 20 | 2013 |

Correction of short-range dislocations in a multi-beam writer E Platzgummer, C Spengler, M Wagner, S Kvasnica US Patent 9,568,907, 2017 | 19 | 2017 |

Simplex of bound entangled multipartite qubit states BC Hiesmayr, F Hipp, M Huber, P Krammer, C Spengler Physical Review A—Atomic, Molecular, and Optical Physics 78 (4), 042327, 2008 | 18 | 2008 |

Mask process correction validation for multi-beam mask lithography I Bork, P Buck, C Bürgel, B Durvasula, S Eder-Kapl, P Hudek, M Jurkovic, ... Photomask Technology 2018 10810, 73-82, 2018 | 10 | 2018 |

Dose-related feature reshaping in an exposure pattern to be exposed in a multi beam writing apparatus E Platzgummer, C Spengler, W Naetar US Patent 10,522,329, 2019 | 9 | 2019 |

Advanced dose-level quantization of multibeam-writers E Platzgummer, C Spengler, HP Petsch US Patent 10,325,757, 2019 | 9 | 2019 |

Charged-particle source and method for cleaning a charged-particle source using back-sputtering E Platzgummer, M Capriotti, C Spengler US Patent 10,840,054, 2020 | 8 | 2020 |

Non-linear dose-and blur-dependent edge placement correction E Platzgummer, C Spengler, W Naetar US Patent 10,651,010, 2020 | 5 | 2020 |

Multi-beam mask writing opens up new fields of application M Tomandl, C Spengler, C Klein, H Loeschner, E Platzgummer 38th European Mask and Lithography Conference (EMLC 2023) 12802, 28-34, 2023 | 3 | 2023 |

Correction of Blur Variation in a Multi-Beam Writer C Spengler, W Naetar, J Leitner US Patent App. 17/166,812, 2021 | 3 | 2021 |

Multi-beam mask writing opens up new fields of application, including curvilinear mask pattern for high numerical aperture extreme ultraviolet lithography M Tomandl, C Spengler, P Hudek, C Klein, H Loeschner, E Platzgummer Journal of Micro/Nanopatterning, Materials, and Metrology 23 (1), 011205-011205, 2024 | 1 | 2024 |