Susumu Toko
Susumu Toko
確認したメール アドレス: tohoku.ac.jp
タイトル引用先
Effects of cluster incorporation into hydrogenated amorphous silicon films in initial discharge phase on film stability
S Toko, Y Torigoe, W Chen, D Yamashita, H Seo, N Itagaki, K Koga, ...
Thin Solid Films 587, 126-131, 2015
162015
Hysteresis in volume fraction of clusters incorporated into a-Si: H films deposited by SiH4 plasma chemical vapor deposition
S Toko, Y Torigoe, K Keya, T Kojima, H Seo, N Itagaki, K Koga, ...
Surface and Coatings Technology 326, 388-394, 2017
112017
Correlation between SiH2/SiH and light-induced degradation of p–i–n hydrogenated amorphous silicon solar cells
K Keya, T Kojima, Y Torigoe, S Toko, D Yamashita, H Seo, N Itagaki, ...
Japanese Journal of Applied Physics 55 (7S2), 07LE03, 2016
92016
Effects of filter gap of cluster-eliminating filter on cluster eliminating efficiency
Y Hashimoto, S Toko, D Yamashita, H Seo, K Kamataki, N Itagaki, K Koga, ...
Journal of Physics: Conference Series 518 (1), 012007, 2014
92014
Effects of gas flow rate on deposition rate and number of Si clusters incorporated into a-Si: H films
S Toko, Y Torigoe, K Keya, H Seo, N Itagaki, K Koga, M Shiratani
Japanese Journal of Applied Physics 55 (1S), 01AA19, 2015
72015
Contribution of ionic precursors to deposition rate of a-Si: H films fabricated by plasma CVD
S Toko, Y Hashimoto, Y Kanemitu, Y Torigoe, H Seo, G Uchida, ...
Journal of Physics: Conference Series 518 (1), 012008, 2014
62014
Optical Bandgap Energy of Si Nanoparticle Composite Films Deposited by a Multi-Hollow Discharge Plasma Chemical Vapor Deposition Method
S Toko, Y Kanemitsu, K Koga, H Seo, N Itagaki, M Shiratani
Journal of Nanoscience and Nanotechnology 16 (10), 10753-10757, 2016
32016
Effects of Gas Velocity on Deposition Rate and Amount of Cluster Incorporation into a-Si: H Films Fabricated by SiH4 Plasma Chemical Vapor Deposition
T Kojima, S Toko, K Tanaka, H Seo, N Itagaki, K Koga, M Shiratani
Plasma and Fusion Research 13, 1406082-1406082, 2018
22018
Dependence of CO2 Conversion to CH4 on the CO2 Flow Rate in a Helicon Discharge Plasma
S Toko, R Katayama, K Koga, E Leal-Quiros, M Shiratani
Science of Advanced Materials 10 (5), 655-659, 2018
12018
Optical emission spectroscopy of plasma-catalytic CO methanation
A Yamamoto, M Ideguchi, S Toko, K Koga, M Shiratani
Bulletin of the American Physical Society, 2019
2019
Growing low-temperature, high-quality silicon-dioxide films by neutral-beam enhanced atomic-layer deposition
HH Chen, S Toko, D Ohori, T Ozaki, T Kubota, M Utsuno, T Nozawa, ...
Journal of Physics D: Applied Physics, 2019
2019
Low-Pressure Methanation of CO2 Using a Plasma–Catalyst System
S Toko, S Tanida, K Koga, M Shiratani
Science of Advanced Materials 10 (8), 1087-1090, 2018
2018
Methanation of CO₂ by low pressure helicon plasma discharge
T Susumu, R KATAYAMA, K Kazunori, M SHIRATANI
한국진공학회 학술발표회초록집, 1027-1027, 2016
2016
Time evolution of radical deposition rate and cluster amount
M SHIRATANI, T Susumu, Y TORIGOE, K Kimitaka, T KOJIMA, ...
한국진공학회 학술발표회초록집, 37-37, 2016
2016
Raman spectroscopy of PIN hydrogenated amorphous silicon solar cells
K Keya, Y Torigoe, S Toko, D Yamashita, H Seo, N Itagaki, K Koga, ...
APS Meeting Abstracts, 2015
2015
Cluster Incorporation into A-Si: H Films Deposited Using H2+ SiH4 Discharge Plasmas
S Toko, Y Torigoe, K Keya, H Seo, N Itagaki, K Koga, M Shiratani
APS Meeting Abstracts, 2015
2015
Effects of electrode structure on characteristics of multi-hollow discharges
Y Torigoe, K Keya, S Toko, H Seo, H Itagaki, K Koga, M Shiratani
APS Meeting Abstracts, 2015
2015
Cluster Incorporation Control by Hydrogen Silane Mixture in Multi Hollow Discharge Plasma CVD
S Toko, Y Torigoe, Y Kanemitu, H Seo, K Koga, M Shiratani
APS Meeting Abstracts, 2014
2014
Effects of Grid DC Bias on Incorporation of Si Clusters into Amorphous Silicon Thin Films in Multi-Hollow Discharge Plasma CVD
S Toko, Y Kim, Y Hashimoto, Y Kanemitu, H Seo, G Uchida, K Kamataki, ...
Proceedings of the 12th Asia Pacific Physics Conference (APPC12), 015069, 2014
2014
Cluster incorporation during amplitude modulated VHF discharge silane plasmas
S Toko, Y Kim, Y Hashimoto, Y Kanemitu, H Seo, G Uchida, K Kamataki, ...
APS Meeting Abstracts, 2013
2013
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