| Effects of cluster incorporation into hydrogenated amorphous silicon films in initial discharge phase on film stability S Toko, Y Torigoe, W Chen, D Yamashita, H Seo, N Itagaki, K Koga, ... Thin Solid Films 587, 126-131, 2015 | 20 | 2015 |
| Correlation between SiH2/SiH and light-induced degradation of p–i–n hydrogenated amorphous silicon solar cells K Keya, T Kojima, Y Torigoe, S Toko, D Yamashita, H Seo, N Itagaki, ... Japanese journal of applied physics 55 (7S2), 07LE03, 2016 | 17 | 2016 |
| Spatiotemporal optical emission spectroscopy to estimate electron density and temperature of plasmas in solution K Inoue, S Takahashi, N Sakakibara, S Toko, T Ito, K Terashima Journal of Physics D: Applied Physics 53 (23), 235202, 2020 | 16 | 2020 |
| Hysteresis in volume fraction of clusters incorporated into a-Si: H films deposited by SiH4 plasma chemical vapor deposition S Toko, Y Torigoe, K Keya, T Kojima, H Seo, N Itagaki, K Koga, ... Surface and Coatings Technology 326, 388-394, 2017 | 14 | 2017 |
| Effects of filter gap of cluster-eliminating filter on cluster eliminating efficiency Y Hashimoto, S Toko, D Yamashita, H Seo, K Kamataki, N Itagaki, K Koga, ... Journal of Physics: Conference Series 518 (1), 012007, 2014 | 11 | 2014 |
| Development of a non-thermal atmospheric pressure plasma-assisted technology for the direct joining of metals with dissimilar materials K Takenaka, R Machida, T Bono, A Jinda, S Toko, G Uchida, Y Setsuhara Journal of Manufacturing Processes 75, 664-669, 2022 | 10 | 2022 |
| Effects of gas flow rate on deposition rate and number of Si clusters incorporated into a-Si: H films S Toko, Y Torigoe, K Keya, H Seo, N Itagaki, K Koga, M Shiratani Japanese journal of applied physics 55 (1S), 01AA19, 2015 | 10 | 2015 |
| Effect of gas flow rate and discharge volume on CO2 methanation with plasma catalysis S Toko, M Ideguchi, T Hasegawa, T Okumura, K Kamataki, K Takenaka, ... Japanese journal of applied physics 61 (SI), SI1002, 2022 | 7 | 2022 |
| Contribution of ionic precursors to deposition rate of a-Si: H films fabricated by plasma CVD S Toko, Y Hashimoto, Y Kanemitu, Y Torigoe, H Seo, G Uchida, ... Journal of Physics: Conference Series 518 (1), 012008, 2014 | 7 | 2014 |
| Dependence of CO2 Conversion to CH4 on the CO2 Flow Rate in a Helicon Discharge Plasma S Toko, R Katayama, K Koga, E Leal-Quiros, M Shiratani Science of Advanced Materials 10 (5), 655-659, 2018 | 6 | 2018 |
| Effects of gas velocity on deposition rate and amount of cluster incorporation into a-Si: H films fabricated by SiH4 plasma chemical vapor deposition T Kojima, S Toko, K Tanaka, H Seo, N Itagaki, K Koga, M Shiratani Plasma and Fusion Research 13, 1406082-1406082, 2018 | 5 | 2018 |
| Low-Pressure Methanation of CO2 Using a Plasma–Catalyst System S Toko, S Tanida, K Koga, M Shiratani Science of Advanced Materials 10 (8), 1087-1090, 2018 | 4 | 2018 |
| Optical bandgap energy of Si nanoparticle composite films deposited by a multi-hollow discharge plasma chemical vapor deposition method S Toko, Y Kanemitsu, K Koga, H Seo, N Itagaki, M Shiratani Journal of nanoscience and nanotechnology 16 (10), 10753-10757, 2016 | 4 | 2016 |
| Electron Microscopy Study of Binary Nanocolloidal Crystals with ico-AB13 Structure Made of Monodisperse Silica Nanoparticles Y Sakamoto, Y Kuroda, S Toko, T Ikeda, T Matsui, K Kuroda The Journal of Physical Chemistry C 118 (27), 15004-15010, 2014 | 4 | 2014 |
| Optical emission spectroscopy study in CO2 methanation with plasma S Toko, T Hasegawa, T Okumura, K Kamataki, K Takenaka, K Koga, ... Japanese journal of applied physics 62 (SI), SI1008, 2023 | 3 | 2023 |
| Stability and gap states of amorphous In-Ga-Zn-Ox thin film transistors: Impact of sputtering configuration and post-annealing on device performance K Takenaka, S Nunomura, Y Hayashi, H Komatsu, S Toko, H Tampo, ... Thin Solid Films 790, 140203, 2024 | 2 | 2024 |
| Direct bonding of stainless steel and PEEK using non-thermal atmospheric pressure plasma-assisted joining technology K Takenaka, A Jinda, S Nakamoto, S Toko, G Uchida, Y Setsuhara Journal of Manufacturing Processes 105, 276-281, 2023 | 2 | 2023 |
| Improving the efficiency of Sabatier reaction through H2O removal with low-pressure plasma catalysis T Hasegawa, S Toko, K Kamataki, K Koga, M Shiratani Japanese Journal of Applied Physics 62 (SL), SL1028, 2023 | 2 | 2023 |
| Growing low-temperature, high-quality silicon-dioxide films by neutral-beam enhanced atomic-layer deposition HH Chen, S Toko, D Ohori, T Ozaki, M Utsuno, T Kubota, T Nozawa, ... Journal of Physics D: Applied Physics 53 (1), 015204, 2019 | 2 | 2019 |
| Influence of pre-treatment using non-thermal atmospheric pressure plasma jet on aluminum alloy A1050 to PEEK direct joining with hot-pressing process K Takenaka, A Jinda, S Nakamoto, R Koyari, S Toko, G Uchida, ... The International Journal of Advanced Manufacturing Technology 130 (3), 1925 …, 2024 | 1 | 2024 |
