フォロー
Juline Shoeb
Juline Shoeb
Lam research corporation
確認したメール アドレス: lamrc.com
タイトル
引用先
引用先
Damage by radicals and photons during plasma cleaning of porous low-k SiOCH. I. Ar/O2 and He/H2 plasmas
J Shoeb, MM Wang, MJ Kushner
Journal of Vacuum Science & Technology A 30 (4), 2012
602012
A fast and accurate maximum power point tracker for PV systems
S Yuvarajan, J Shoeb
2008 Twenty-Third Annual IEEE Applied Power Electronics Conference and …, 2008
532008
Damage by radicals and photons during plasma cleaning of porous low-k SiOCH. II. Water uptake and change in dielectric constant
J Shoeb, MJ Kushner
Journal of Vacuum Science & Technology A 30 (4), 2012
362012
Mechanisms for sealing of porous low-k SiOCH by combined He and NH3 plasma treatment
J Shoeb, MJ Kushner
Journal of Vacuum Science & Technology A 29 (5), 2011
272011
Methods and apparatuses for etch profile matching by surface kinetic model optimization
MD Tetiker, S Sriraman, AD Bailey III, J Shoeb, A Paterson, RA Gottscho
US Patent 10,386,828, 2019
212019
Mechanisms for plasma etching of HfO2 gate stacks with Si selectivity and photoresist trimming
J Shoeb, MJ Kushner
Journal of Vacuum Science & Technology A 27 (6), 1289-1302, 2009
202009
Systems and methods for achieving peak ion energy enhancement with a low angular spread
J Shoeb, Y Wu, A Paterson
US Patent 10,395,894, 2019
192019
Multi-level pulsing of DC and RF signals
J Shoeb, A Paterson, Y Wu
US Patent 10,580,618, 2020
102020
Polymer Cleaning From Porous Low- Dielectrics in Plasmas
J Shoeb, MJ Kushner
IEEE Transactions on Plasma Science 39 (11), 2828-2829, 2011
72011
Multi-level parameter and frequency pulsing with a low angular spread
J Shoeb, A Paterson, Y Wu
US Patent 10,224,183, 2019
62019
Multi-level parameter and frequency pulsing with a low angular spread
J Shoeb, A Paterson, Y Wu
US Patent 10,573,494, 2020
42020
Multi-level pulsing of DC and RF signals
J Shoeb, A Paterson, Y Wu
US Patent 10,304,660, 2019
42019
Minimizing damage of porous SiCOH using He/H2 plasmas
J Shoeb, MJ Kushner
2011 Abstracts IEEE International Conference on Plasma Science, 1-1, 2011
22011
Pulsing rf coils of a plasma chamber in reverse synchronization
J Shoeb, TA Kamp, AM Paterson
US Patent App. 18/015,708, 2023
12023
Multi-level parameter and frequency pulsing with a low angular spread
J Shoeb, A Paterson, Y Wu
US Patent 11,462,390, 2022
12022
Etching isolation features and dense features within a substrate
J Shoeb, AM Paterson, Y Wu
US Patent 11,398,387, 2022
12022
Multi-level parameter and frequency pulsing with a low angular spread
J Shoeb, A Paterson, Y Wu
12019
Comparison Of Cleaning And Damage Of Porous Low-k SiCOH In Ar/O 2 And He/H 2 Plasmas With UV/VUV Fluxes
J Shoeb, MJ Kushner
Ispc 20, 2-5, 2011
12011
Systems and methods for achieving peak ion energy enhancement with a low angular spread
J Shoeb, Y Wu, A Paterson
US Patent 11,915,912, 2024
2024
Systems for controlling plasma density distribution profiles including multi-rf zoned substrate supports
J Shoeb, AM Paterson
US Patent App. 18/013,145, 2023
2023
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