フォロー
Tomoyuki TANIKAWA
タイトル
引用先
引用先
Growth of semi‐polar (11‐22) GaN on a (113) Si substrate by selective MOVPE
T Tanikawa, T Hikosaka, Y Honda, M Yamaguchi, N Sawaki
physica status solidi c 5 (9), 2966-2968, 2008
1002008
Three-dimensional imaging of threading dislocations in GaN crystals using two-photon excitation photoluminescence
T Tanikawa, K Ohnishi, M Kanoh, T Mukai, T Matsuoka
Applied Physics Express 11 (3), 031004, 2018
882018
Red to blue wavelength emission of N-polar InGaN light-emitting diodes grown by metalorganic vapor phase epitaxy
K Shojiki, T Tanikawa, JH Choi, S Kuboya, T Hanada, R Katayama, ...
Applied Physics Express 8 (6), 061005, 2015
632015
Growth of non-polar (1 1 2¯ 0) GaN on a patterned (1 1 0) Si substrate by selective MOVPE
T Tanikawa, D Rudolph, T Hikosaka, Y Honda, M Yamaguchi, N Sawaki
Journal of Crystal Growth 310 (23), 4999-5002, 2008
532008
Reduction of efficiency droop in semipolar (1101) InGaN/GaN light emitting diodes grown on patterned silicon substrates
CH Chiu, DW Lin, CC Lin, ZY Li, WT Chang, HW Hsu, HC Kuo, TC Lu, ...
Applied physics express 4 (1), 012105, 2010
502010
Fabrication and properties of semi‐polar (1‐101) and (11‐22) InGaN/GaN light emitting diodes on patterned Si substrates
T Hikosaka, T Tanikawa, Y Honda, M Yamaguchi, N Sawaki
physica status solidi c 5 (6), 2234-2237, 2008
402008
Partial strain relaxation by stacking fault generation in InGaN multiple quantum wells grown on (11¯ 01) semipolar GaN
ZH Wu, T Tanikawa, T Murase, YY Fang, CQ Chen, Y Honda, ...
Applied Physics Letters 98 (5), 2011
392011
Optically pumped lasing properties of InGaN/GaN stripe multiquantum wells with ridge cavity structure on patterned (001) Si substrates
M Kushimoto, T Tanikawa, Y Honda, H Amano
Applied Physics Express 8 (2), 022702, 2015
362015
Control of impurity concentration in N‐polar () GaN grown by metalorganic vapor phase epitaxy
T Tanikawa, S Kuboya, T Matsuoka
physica status solidi (b) 254 (8), 1600751, 2017
302017
Improvement of surface morphology of nitrogen-polar GaN by introducing indium surfactant during MOVPE growth
T Aisaka, T Tanikawa, T Kimura, K Shojiki, T Hanada, R Katayama, ...
Japanese Journal of Applied Physics 53 (8), 085501, 2014
302014
Ga‐polar GaN film grown by MOVPE on cleaved ScAlMgO4 (0001) substrate with millimeter‐scale wide terraces
T Iwabuchi, S Kuboya, T Tanikawa, T Hanada, R Katayama, T Fukuda, ...
physica status solidi (a) 214 (9), 1600754, 2017
292017
Halide vapor phase epitaxy of thick GaN films on ScAlMgO4 substrates and their self-separation for fabricating freestanding wafers
K Ohnishi, M Kanoh, T Tanikawa, S Kuboya, T Mukai, T Matsuoka
Applied Physics Express 10 (10), 101001, 2017
252017
Growth of GaN on Si (111) substrates via a reactive-sputter-deposited AlN intermediate layer
T Yamada, T Tanikawa, Y Honda, M Yamaguchi, H Amano
Japanese Journal of Applied Physics 52 (8S), 08JB16, 2013
252013
Reuse of ScAlMgO4 substrates utilized for halide vapor phase epitaxy of GaN
K Ohnishi, S Kuboya, T Tanikawa, T Iwabuchi, K Yamamura, N Hasuike, ...
Japanese Journal of Applied Physics 58 (SC), SC1023, 2019
232019
N-polar GaN/AlGaN/GaN metal–insulator–semiconductor high-electron-mobility transistor formed on sapphire substrate with minimal step bunching
K Prasertsuk, T Tanikawa, T Kimura, S Kuboya, T Suemitsu, T Matsuoka
Applied Physics Express 11 (1), 015503, 2017
232017
HVPE growth of semi-polar (1 1 2¯ 2) GaN on GaN template (1 1 3) Si substrate
N Suzuki, T Uchida, T Tanikawa, T Hikosaka, Y Honda, M Yamaguchi, ...
Journal of crystal growth 311 (10), 2875-2878, 2009
232009
Enhancement of surface migration by Mg doping in the metalorganic vapor phase epitaxy of N-polar GaN/sapphire
T Tanikawa, K Shojiki, T Aisaka, T Kimura, S Kuboya, T Hanada, ...
Japanese Journal of Applied Physics 53 (5S1), 05FL05, 2014
212014
Optical Study of Sub-10 nm In0.3Ga0.7N Quantum Nanodisks in GaN Nanopillars
A Higo, T Kiba, S Chen, Y Chen, T Tanikawa, C Thomas, CY Lee, YC Lai, ...
ACS Photonics 4 (7), 1851-1857, 2017
182017
Photonic properties of erbium doped InGaN alloys grown on Si (001) substrates
IW Feng, XK Cao, J Li, JY Lin, HX Jiang, N Sawaki, Y Honda, T Tanikawa, ...
Applied Physics Letters 98 (8), 2011
182011
Maskless selective growth of semi-polar (1 12¯ 2) GaN on Si (3 1 1) substrate by metal organic vapor phase epitaxy
M Yang, HS Ahn, T Tanikawa, Y Honda, M Yamaguchi, N Sawaki
Journal of crystal growth 311 (10), 2914-2918, 2009
182009
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論文 1–20