フォロー
Nobuya Hiroshiba
Nobuya Hiroshiba
Ph.D., Associate Professor, Osaka Institute of Technology.
確認したメール アドレス: oit.ac.jp - ホームページ
タイトル
引用先
引用先
Sub-10 nm Nanofabrication via Nanoimprint Directed Self-Assembly of Block Copolymers
SM Park, X Liang, BD Harteneck, TE Pick, N Hiroshiba, Y Wu, BA Helms, ...
ACS nano 5 (11), 8523-8531, 2011
1692011
C60 field effect transistor with electrodes modified by La@ C82
N Hiroshiba, K Tanigaki, R Kumashiro, H Ohashi, T Wakahara, T Akasaka
Chemical physics letters 400 (1-3), 235-238, 2004
582004
Low-glancing-angle x-ray diffraction study on the relationship between crystallinity and properties of C60 field effect transistor
H Ohashi, K Tanigaki, R Kumashiro, S Sugihara, S Hiroshiba, S Kimura, ...
Applied physics letters 84 (4), 520-522, 2004
372004
Energy-level alignments and photo-induced carrier processes at the heteromolecular interface of quaterrylene and N, N′-dioctyl-3, 4, 9, 10-perylenedicarboximide
N Hiroshiba, R Hayakawa, T Chikyow, Y Yamashita, H Yoshikawa, ...
Physical Chemistry Chemical Physics 13 (13), 6280-6285, 2011
352011
Single‐Electron Tunneling through Molecular Quantum Dots in a Metal‐Insulator‐Semiconductor Structure
R Hayakawa, N Hiroshiba, T Chikyow, Y Wakayama
Advanced Functional Materials 21 (15), 2933-2937, 2011
262011
Selection of di (meth) acrylate monomers for low pollution of fluorinated mold surfaces in ultraviolet nanoimprint lithography
M Nakagawa, K Kobayashi, AN Hattori, S Ito, N Hiroshiba, S Kubo, ...
Langmuir 31 (14), 4188-4195, 2015
252015
Broadband terahertz spectroscopy of cellulose nanofiber-reinforced polypropylenes
S Ariyoshi, S Hashimoto, S Ohnishi, S Negishi, H Mikami, K Hayashi, ...
Materials Science and Engineering: B 265, 115000, 2021
192021
Elemental depth profiles and plasma etching rates of positive-tone electron beam resists after sequential infiltration synthesis of alumina
Y Ozaki, S Ito, N Hiroshiba, T Nakamura, M Nakagawa
Japanese Journal of Applied Physics 57 (6S1), 06HG01, 2018
182018
Discharge of viscous UV-curable resin droplets by screen printing for UV nanoimprint lithography
A Tanabe, T Uehara, K Nagase, H Ikedo, N Hiroshiba, T Nakamura, ...
Japanese Journal of Applied Physics 55 (6S1), 06GM01, 2016
182016
Strain-effect for controlled growth mode and well-ordered structure of quaterrylene thin films
R Hayakawa, A Turak, XN Zhang, N Hiroshiba, H Dosch, T Chikyow, ...
The Journal of chemical physics 133 (3), 2010
172010
ACS Nano
YS Park, XG Liang, BD Harteneck, TE Pick, N Hiroshiba, Y Wu
M, T. Tuominen, and TP Russell, ACS Nano 2 (7), 1363-1370, 2008
172008
Growth and structural characterization of molecular superlattice of quaterrylene and N, N′-dioctyl-3, 4, 9, 10-perylenedicarboximide
N Hiroshiba, R Hayakawa, M Petit, T Chikyow, K Matsuishi, Y Wakayama
Organic electronics 10 (5), 1032-1036, 2009
162009
Rubrene single crystal field-effect transistor with epitaxial BaTiO3 high-k gate insulator
N Hiroshiba, R Kumashiro, K Tanigaki, T Takenobu, Y Iwasa, K Kotani, ...
Applied physics letters 89 (15), 2006
162006
Viscosity range of UV-curable resins usable in print and imprint method for preparing sub-100-nm-wide resin patterns
T Uehara, A Onuma, A Tanabe, K Nagase, H Ikedo, N Hiroshiba, ...
Journal of Vacuum Science & Technology B 34 (6), 2016
152016
Anisotropic oxygen reactive ion etching for removing residual layers from 45 nm-width imprint patterns
T Uehara, S Kubo, N Hiroshiba, M Nakagawa
Journal of Photopolymer Science and Technology 29 (2), 201-208, 2016
152016
Ambipolar carrier transport in hetero-layered organic transistors consisting of quaterrylene and N, N′-dioctyl-3, 4, 9, 10-perylenedicarboximide
N Hiroshiba, R Hayakawa, T Chikyow, K Matsuishi, Y Wakayama
Organic Electronics 12 (8), 1336-1340, 2011
152011
Size-dependent filling behavior of uv-curable di (meth) acrylate resins into carbon-coated anodic aluminum oxide pores of around 20 nm
M Nakagawa, A Nakaya, Y Hoshikawa, S Ito, N Hiroshiba, T Kyotani
ACS applied materials & interfaces 8 (44), 30628-30634, 2016
142016
Stress Release Drives Growth Transition of Quaterrylene Thin Films on SiO2 Surfaces
R Hayakawa, XN Zhang, H Dosch, N Hiroshiba, T Chikyow, Y Wakayama
The Journal of Physical Chemistry C 113 (6), 2197-2199, 2009
142009
FET properties of chemically modified carbon nanotubes
R Kumashiro, N Hiroshiba, N Komatsu, T Akasaka, Y Maeda, S Suzuki, ...
Journal of Physics and Chemistry of Solids 69 (5-6), 1206-1208, 2008
142008
Structural analysis and transistor properties of hetero-molecular bilayers
N Hiroshiba, R Hayakawa, M Petit, T Chikyow, K Matsuishi, Y Wakayama
Thin Solid Films 518 (2), 441-443, 2009
132009
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論文 1–20