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Sachie Fujikawa
Sachie Fujikawa
Verified email at mail.saitama-u.ac.jp
Title
Cited by
Cited by
Year
Quaternary InAlGaN-based high-efficiency ultraviolet light-emitting diodes
H Hirayama
Journal of Applied Physics 97 (9), 2005
795*2005
Recent progress and future prospects of AlGaN-based high-efficiency deep-ultraviolet light-emitting diodes
H Hirayama, N Maeda, S Fujikawa, S Toyoda, N Kamata
Japanese Journal of Applied Physics 53 (10), 100209, 2014
5692014
222–282 nm AlGaN and InAlGaN‐based deep‐UV LEDs fabricated on high‐quality AlN on sapphire
H Hirayama, S Fujikawa, N Noguchi, J Norimatsu, T Takano, K Tsubaki, ...
physica status solidi (a) 206 (6), 1176-1182, 2009
5112009
Recent progress in AlGaN‐based deep‐UV LEDs
H Hirayama, S Fujikawa, N Kamata
Electronics and Communications in Japan 98 (5), 1-8, 2015
1542015
Fabrication of a low threading dislocation density ELO‐AlN template for application to deep‐UV LEDs
H Hirayama, S Fujikawa, J Norimatsu, T Takano, K Tsubaki, N Kamata
physica status solidi c 6 (S2 2), S356-S359, 2009
1112009
Milliwatt power 270 nm‐band AlGaN deep‐UV LEDs fabricated on ELO‐AlN templates
H Hirayama, J Norimatsu, N Noguchi, S Fujikawa, T Takano, K Tsubaki, ...
physica status solidi c 6 (S2 2), S474-S477, 2009
352009
284–300 nm quaternary InAlGaN-based deep-ultraviolet light-emitting diodes on Si (111) substrates
S Fujikawa, H Hirayama
Applied physics express 4 (6), 061002, 2011
332011
Realization of 340-nm-band high-output-power (> 7 mW) InAlGaN quantum well ultraviolet light-emitting diode with p-type InAlGaN
S Fujikawa, T Takano, Y Kondo, H Hirayama
Japanese journal of applied physics 47 (4S), 2941, 2008
282008
Impact of Mg level on lattice relaxation in a p-AlGaN hole source layer and attempting excimer laser annealing on p-AlGaN HSL of UVB emitters
MA Khan, JP Bermundo, Y Ishikawa, H Ikenoue, S Fujikawa, E Matsuura, ...
Nanotechnology 32 (5), 055702, 2020
272020
Milliwatt power UV-A LEDs developed by using n-AlGaN superlattice buffer layers grown on AlN templates
T Matsumoto, MA Khan, N Maeda, S Fujikawa, N Kamata, H Hirayama
Journal of Physics D: Applied Physics 52 (11), 115102, 2019
272019
222-282 nm AlGaN and InAlGaN based deep-UV LEDs fabricated on high-quality AlN template
H Hirayama, N Noguchi, S Fujikawa, J Norimatsu, N Kamata, T Takano, ...
Gallium Nitride Materials and Devices IV 7216, 301-314, 2009
262009
Light emitting element and method for manufacturing same
Y Kashima, E Matsuura, H Nishihara, T Tashiro, T Ookawa, H Hirayama, ...
US Patent 9,349,918, 2016
202016
Nitride semi-conductor light emitting device and a process of producing a nitride semi-conductor light emitting device
T Takano, K Tsubaki, H Hirayama, S Fujikawa
US Patent 8,120,013, 2012
202012
Effect of low‐temperature‐grown GaSb layer on formation of high‐density and small GaSb islands on Si (100) substrate
R Machida, R Toda, S Fujikawa, S Hara, I Watanabe, HI Fujishiro
physica status solidi (b) 253 (4), 648-653, 2016
142016
High‐efficiency AlGaN deep‐UV LEDs fabricated on a‐and m‐axis oriented c‐plane sapphire substrates
S Fujikawa, H Hirayama, N Maeda
physica status solidi c 9 (3‐4), 790-793, 2012
132012
Effects of ultraviolet B irradiation on cell–cell interaction; implication of morphological changes and actin filaments in irradiated cells
TL Maekawa, TA Takahashi, M Fujihara, J Akasaka, S Fujikawa, ...
Clinical & Experimental Immunology 105 (2), 389-396, 1996
131996
Quaternary InAlGaN quantum‐dot ultraviolet light‐emitting diode emitting at 335 nm fabricated by anti‐surfactant method
H Hirayama, S Fujikawa
physica status solidi c 5 (6), 2312-2315, 2008
122008
Effects of Ga-induced reconstructed surfaces and atomic steps on the morphology of GaSb islands on Si (1 0 0)
R Machida, R Toda, S Fujikawa, S Hara, I Watanabe, HI Fujishiro
Applied Surface Science 351, 686-692, 2015
112015
Comparative study on nano‐scale III‐V double‐gate MOSFETs with various channel materials
A Nishida, K Hasegawa, R Ohama, S Fujikawa, S Hara, HI Fujishiro
physica status solidi (c) 10 (11), 1413-1416, 2013
102013
Surface cleaning and pure nitridation of GaSb by in-situ plasma processing
T Gotow, S Fujikawa, HI Fujishiro, M Ogura, WH Chang, T Yasuda, ...
AIP Advances 7 (10), 2017
92017
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