フォロー
Hideo Hosono
Hideo Hosono
Professor, MDX Research Center for Element strategy, Tokyo Institute of Technology
確認したメール アドレス: mces.titech.ac.jp - ホームページ
タイトル
引用先
引用先
Iron-Based Layered Superconductor La[O1-xFx]FeAs (x = 0.05−0.12) with Tc = 26 K
Y Kamihara, T Watanabe, M Hirano, H Hosono
Journal of the American Chemical Society 130 (11), 3296-3297, 2008
10830*2008
Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors
K Nomura, H Ohta, A Takagi, T Kamiya, M Hirano, H Hosono
nature 432 (7016), 488-492, 2004
89502004
P-type electrical conduction in transparent thin films of CuAlO2
H Kawazoe, M Yasukawa, H Hyodo, M Kurita, H Yanagi, H Hosono
Nature 389 (6654), 939-942, 1997
4079*1997
Amorphous Oxide And Thin Film Transistor
H Hosono, M Hirano, H Ota, T Kamiya, K Nomura
US Patent App. 10/592,431, 2007
39512007
Natural-superlattice homologous single crystal thin film, method for preparation thereof, and device using said single crystal thin film
H Hosono, H Ota, M Orita, K Ueda, M Hirano, T Kamiya
US Patent 7,061,014, 2006
39082006
Display
H Kumomi, H Hosono, T Kamiya, K Nomura
US Patent 7,791,072, 2010
38672010
Integrated circuits utilizing amorphous oxides
K Abe, H Hosono, T Kamiya, K Nomura
US Patent 7,863,611, 2011
38342011
Light-emitting device
T Den, T Iwasaki, H Hosono, T Kamiya, K Nomura
US Patent 7,872,259, 2011
38302011
Amorphous oxide and field effect transistor
M Sano, K Nakagawa, H Hosono, T Kamiya, K Nomura
US Patent App. 11/269,600, 2006
38212006
Field effect transistor
M Sano, K Nakagawa, H Hosono, T Kamiya, K Nomura
US Patent 7,868,326, 2011
38152011
Field effect transistor manufacturing method
H Yabuta, M Sano, T Iwasaki, H Hosono, T Kamiya, K Nomura
US Patent 7,829,444, 2010
38112010
Oxide thin film
H Kawazoe, H Hosono, A Kudo, H Yanagi
US Patent 6,294,274, 2001
38022001
Sensor and image pickup device
K Saito, H Hosono, T Kamiya, K Nomura
US Patent 7,453,065, 2008
37932008
Amorphous oxide and thin film transistor
H Hosono, M Hirano, H Ota, T Kamiya, K Nomura
US Patent 10,032,930, 2018
37682018
Amorphous oxide and thin film transistor
H Hosono, M Hirano, H Ota, T Kamiya, K Nomura
US Patent App. 12/504,158, 2009
37652009
LnCuO (S, Se, Te) monocrystalline thin film, its manufacturing method, and optical device or electronic device using the monocrystalline thin film
H Hosono, M Hirano, H Ota, M Orita, H Hiramatsu, K Ueda
US Patent 7,323,356, 2008
37602008
Thin-film transistor fabricated in single-crystalline transparent oxide semiconductor
K Nomura, H Ohta, K Ueda, T Kamiya, M Hirano, H Hosono
Science 300 (5623), 1269-1272, 2003
30882003
Present status of amorphous In–Ga–Zn–O thin-film transistors
T Kamiya, K Nomura, H Hosono
Science and Technology of Advanced Materials, 2010
2346*2010
Superconductivity at 43 K in an iron-based layered compound LaO1-xFxFeAs
H Takahashi, K Igawa, K Arii, Y Kamihara, M Hirano, H Hosono
nature 453 (7193), 376-378, 2008
16602008
Amorphous oxide semiconductors for high-performance flexible thin-film transistors
K Nomura, A Takagi, T Kamiya, H Ohta, M Hirano, H Hosono
Japanese journal of applied physics 45 (5S), 4303, 2006
15092006
現在システムで処理を実行できません。しばらくしてからもう一度お試しください。
論文 1–20